Silicon lead halides

The CpFe(C02)- anion reacts concurrently by Sn2 and free radical processes with alkyl halides (108) (Scheme 22, eq. [33]) the same ion is easily able to displace Cl from silicon, leading to the formation of an Fe-Si bond (Scheme 22, eq. [34]) (109). At the opposite extreme, Cp(DPPE)FeMgBr shows very low nucleophilicity and reacts with alkyl halides only by a radical process (Scheme 22, eq. [35]) (109). This same reagent was found completely unreactive toward halosilanes, which are known to be very reactive substrates in nucleophilic reactions (Scheme 22, eq. [36]) (109). 

Derivatives of Silicon, Germanium, Tin, and Lead containing Bonds to Transition Metals.— The substitution of organo-silicon, -germanium, -tin, and -lead halides... 

All Group IV elements form tetrachlorides, MX4, which are predominantly tetrahedral and covalent. Germanium, tin and lead also form dichlorides, these becoming increasingly ionic in character as the atomic weight of the Group IV element increases and the element becomes more metallic. Carbon and silicon form catenated halides which have properties similar to their tetrahalides. 

Isomerically pure 1 is obtained when HMes2SiSiPh2SiPh2SiMes2H (Mes = mesityl) 5 is used as a starting material, because bonds between silicon and methyl substituted aryl groups like p-tolyl or mesityl are cleaved much faster by hydrogen halides than Si-Ph bonds [3], Further reaction of I with HCl or HBr leads to the formation of the corresponding halo-derivatives 2 and 3 ... 

Strontium compounds, 23 319-324 estimated distribution of, 23 3201 world production of, 23 319-320 Strontium cyanide, 8 197 Strontium ferrate (1 1), 5 598 Strontium fluoride, 23 323 Strontium fluoroborate tetrahydrate, 4 153 Strontium halides, 23 323 Strontium hexaferrite, 23 323 Strontium hydride, 13 613 Strontium hydroxide, 23 324 Strontium iodide, 23 323 Strontium-lead alloys, 14 779 Strontium minerals, 23 320 producers of, 23 319 Strontium nitrate, 23 319, 321, 323 Strontium oxide, 23 318, 324 Strontium peroxide, 18 396, 23 324 Strontium-silicon alloy, 22 520 Strontium sulfate, 23 322, 324 Strontium sulfide, 23 322 Strontium titanate... 

Linford and coworkers have shown that the attachment of alkenes to H-terminated silicon surfaces can also be initiated by direct mechanical scribing, in a process termed chemomechanical functionalization [145-147]. The reaction of 1-alkenes (as well as 1-alkynes) leads to attachment of the molecule to the surface through two new Si—C bonds. The proposed mechanism is the mechanical cleavage of Si—H and Si—Si bonds, leading to silicon radicals that then react with the reactive liquid. Interestingly, Linford and coworkers have also extended this work to show that chemomechanical functionalization can be carried out not only on H-terminated Si, but also on sihcon covered with oxide, and have shown that the process works with a variety of halides, alcohols, and epoxides in both the liquid and gas phase [146]. 

Studies of the formation, chemical composition, and properties of deposits have shown that they consist of partially oxidized organic material, including more or less nitrogen, sulfur, and phosphorus. Compounds of iron, silicon, calcium, and other metals are present in small quantity, together with substantial amounts of lead oxides, sulfates, and halides from combustion of the antiknock fluid. The effects of these deposits are both physical and chemical in nature they may physically interfere with lubrication, heat transfer, gas flow, operation of valves and spark plugs chemically, they may bring about corrosion and oxidation. 

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