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Resist with good plasma etch resistance

A recent patent describes a terpolymer of sulfur dioxide with 2-methyl-1-pentene and 2-ethoxy-ethyl methallyl ether as having enhanced compatibility with m-cresol novolac resin. This blend is claimed to have both good sensitivity and good plasma etch resistance. ... [Pg.982]

See other pages where Resist with good plasma etch resistance is mentioned: [Pg.61]    [Pg.61]    [Pg.191]    [Pg.130]    [Pg.290]    [Pg.163]    [Pg.361]    [Pg.130]    [Pg.103]    [Pg.104]    [Pg.130]    [Pg.170]    [Pg.91]    [Pg.101]    [Pg.194]    [Pg.479]    [Pg.325]    [Pg.641]    [Pg.79]    [Pg.69]    [Pg.79]    [Pg.131]    [Pg.143]    [Pg.717]    [Pg.779]    [Pg.107]    [Pg.297]    [Pg.166]    [Pg.191]    [Pg.981]    [Pg.982]    [Pg.988]    [Pg.706]    [Pg.72]    [Pg.123]    [Pg.1023]    [Pg.461]    [Pg.431]    [Pg.244]    [Pg.246]    [Pg.253]    [Pg.460]    [Pg.598]    [Pg.178]    [Pg.222]    [Pg.306]    [Pg.778]    [Pg.46]   
See also in sourсe #XX -- [ Pg.61 ]



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Etch plasma

Etch resist

Etch resistance

Etching resist

Etching resistance

Plasma etching

Plasma etching resist

Plasma resistance

Plasma-etched

Resists etching resistance

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