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Relief images formation, photoresists

Mechanisms of Relief Images Formation in Positive Photoresists... [Pg.2114]

Making a polymer relief image commonly requires two processes. First, there is a photochemical process which alters the solubility of the exposed areas relative to the unexposed areas. This is followed by the actual dissolution of the most soluble areas during development. Historically, studies of photoresists have emphasized the photochemical aspects of image formation rather than the dissolution process. The central theme of this paper is the very Icurge effects on dissolution rate that can result from adding small molecules to the matrix. [Pg.237]

See other pages where Relief images formation, photoresists is mentioned: [Pg.2113]    [Pg.50]    [Pg.388]    [Pg.334]    [Pg.388]    [Pg.2115]    [Pg.3322]    [Pg.53]    [Pg.81]   
See also in sourсe #XX -- [ Pg.2114 , Pg.2115 , Pg.2116 , Pg.2117 , Pg.2118 ]



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