Reactive Deposition Processes

Vapor deposition Physical vapor deposition techniques (eg electron beam evaporation, sputtering etc.) can be used to develop composite coatings using multiple targets in codeposition approach with intermittent reactive deposition process. 

In reactive deposition processes, such as the deposition of UN, the mass flow is important for making the reactive gas (nitrogen) available during the deposition. It should be recognized that the reactive gas is being pumped in the deposition chamber by reaction with the freshly... 

The adsorption of gaseous species on a surface exposed to a plasma is poorly understood but one would expect that adsorption in a plasma would be greater than in the case of gases, due to the presence of radicals, unique species, image forces, surface charge states on insulators, and other such factors. This may be an important factor in reactive deposition processes. ... 

Composite films are those containing two or more phases. Composite films often will be deposited in reactive deposition processes if there is not enough reactive gas available or if there is a mixture of reactive gases. The properties of composite films depend not only on the composition but the size and distribution of the separate phases. Metals may be co-deposited with polymers to form a polymer-metal composite film. This can be done by combining physical sputtering with plasma polymerization,... 

Enhancement of the reactive deposition process - activation of reactive gases, bombardment-enhanced chemical reaction, adsorption of reactive species. 

Acetylene (C2H2) (reactive deposition) A hydrocarbon gas that is used as a chemical vapor precursor to provide carbon in reactive deposition processes. 

Chemical vapor deposition (CVD) is a process whereby a thin solid film is synthesized from the gaseous phase by a chemical reaction. It is this reactive process that distinguishes CVD from physical deposition processes, such as evaporation, sputtering, and sublimation.8 This process is well known and is used to generate inorganic thin films of high purity and quality as well as form polyimides by a step-polymerization process.9-11 Vapor deposition polymerization (VDP) is the method in which the chemical reaction in question is the polymerization of a reactive species generated in the gas phase by thermal (or radiative) activation. 

In the RSDT process, the steps for infroducing cafalysf, ionomer, and carbon into the gas mix are decoupled and can be independently controlled in such a manner that the Pt/C and ionomer/C ratios can be continuously modified during fhe deposition process. Reactive spray deposition technology has the capacity and flexibility required to produce compositionally and... 

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