Pulse magnetron

GoB, D., Frach, P, Zywitzki, O., Modes, T., Klinkenberg, S. and Gottfried, C. (2005). Photo-catalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature. Surf. Coat. Technol. 200( 1—4), 967-971. [Pg.505]

S. Schiller, . Goedicke, J. Reschke, V. Kirchhoff, S. Schneider, F. Milde Pulsed Magnetron Sputter Technology, Surface Coating Technol., 61 (1993) 331... [Pg.316]

F. Fietzke, K. Goedicke and W. Hempel, The deposition of hard crystalline AI2O3 layers by means of bipolar pulsed magnetron sputtering. Surf. Coat. Technol. 1996, 86-87, 657-663. [Pg.996]

Sarakinos K, Alami J, Konstantinidis S (2010) High power pulsed magnetron sputtering A review on scientific and engineering state of the art. Surf Coat Technol 204(11) 1661-1684... [Pg.946]

Baghriche O, Kiwi J, Pulgarin C, Sanjines R. Antibacterial Ag-ZrN surfaces promoted by Zr and deposited by reactive pulsed magnetron sputtering. J Photochem Photobiol A 2012 229 39-45. [Pg.239]

Ehiasarian, Arutiun P, New R, Munz W-D, Hultman L, Helmersson U, Kouznetsov V. Influence of high power densities on the composition of pulsed magnetron plasmas. Vacuum 2002 65(2) 147-54. [Pg.488]

R. Chistyakov, High-power Pulsed Magnetron Sputtering, US Patent 7147759 (12.12.2006). [Pg.192]

High power pulsed magnetron sputtering (HPPMS or HIPPMS), otherwise called high power... [Pg.252]

P. Frach, H. Bartzsch, K. Taeschner, J. Liebig, F. Schultheiss, Multifunctional optical coatings on polymers deposited by pulse magnetron sputtering and magnetron enhanced... [Pg.281]

V. Kouznetsov, K. Mac, J.M. Schneider, U. Helmersson, I. Petrov, A novel pulsed magnetron sputter technique utilizing very high target power densities. Surf. Coat. Technol. 122 (1999) 290. [Pg.282]

K. Mack, V. Kouznetsov, J.M. Schneider, U. Helmerrsson, I. Petrov, Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge, J. Vac. Sci. Technol. A18 (2000) 1533. [Pg.282]

A.P. Ehiasarian, P.Eh. Hovesepian, L. Hultman, U. Helmersson, I. Petrov, High power pulsed magnetron sputtered CrN films. Surf. Coat Technol. 163-164 (2003) 267. [Pg.283]

J. Bohlmark, J. Alami, C. Christov, A.P. Ehiasarian, U. Helmerssen, Ionization of sputtered metals in high power pulsed magnetron sputtering, J. Vac. Sci. Technol. [Pg.330]

J. FaWteich, M. Fahland, N. Schiller, Permeation Barrier Properties of Oxide Layers on Polymer Film Deposited by Pulsed Magnetron Sputtering, in Proceedings of the 50th Annual Technical Conference, Society of Vacuum Coaters, 2007, p. 723. [Pg.437]

HPPMS High power pulse magnetron sputtering... [Pg.762]

Sicha, D. Herman, J. MusU, Z. Stryhal, and J. Pavhk, High-Rate Low-Temperature DC Pulsed Magnetron Sputtering of Photocatal5ftic Ti02 Films The Effect of Repetition Frequency, Nanoscale Res. Lea., 2,123-129 (2007). [Pg.75]

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