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Projection Photolithography Devices

Individual microelectronic devices consist of numerous layers of carefully patterned thin films. Patterning depends upon the ability to define and draw a two-dimensional pattern on a wafer substrate. Currently, this ability depends on photolithography by optical projection, in which a polymer resist film is deposited on the wafer and subsequently exposed to ultraviolet... [Pg.1620]

See other pages where Projection Photolithography Devices is mentioned: [Pg.815]    [Pg.815]    [Pg.2823]    [Pg.4318]    [Pg.1705]    [Pg.5]    [Pg.134]    [Pg.23]    [Pg.49]    [Pg.20]    [Pg.45]    [Pg.965]    [Pg.409]    [Pg.3632]    [Pg.67]    [Pg.300]    [Pg.576]   


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Photolithography

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