Processing methods direct-deposition techniques

Once the structural support layers have been fabricated by extrusion or EPD for tubular cells or by tape casting or powder pressing for planar cells, the subsequent cell layers must be deposited to complete the cell. A wide variety of fabrication methods have been utilized for this purpose, with the choice of method or methods depending on the cell geometry (tubular or planar, and overall size) materials to be deposited and support layer material, both in terms of compatibility of the process with the layer to be deposited and with the previously deposited layers, and desired microstructure of the layer being deposited. In general, the methods can be classified into two very broad categories wet-ceramic techniques and direct-deposition techniques. 

Both wet-ceramic techniques and direct-deposition techniques require preparation of the feedstock, which can consist of dry powders, suspensions of powders in liquid, or solution precursors for the desired phases, such as nitrates of the cations from which the oxides are formed. Section 6.1.3 presented some processing methods utilized to prepare the powder precursors for use in SOFC fabrication. The component fabrication methods are presented here. An overview of the major wet-ceramic and direct-deposition techniques utilized to deposit the thinner fuel cell components onto the thicker structural support layer are presented below. 

The most important nanomaterial synthesis methods include nanolithography techniques, template-directed syntheses, vapor-phase methods, vapor-liquid-solid (VLS) methods, solution-liquid-solid (SLS) approaches, sol-gel processes, micelle, vapor deposition, solvothermal methods, and pyrolysis methods [1, 2]. For many of these procedures, the control of size and shape, the flexibility in the materials that can be synthesized, and the potential for scaling up, are the main limitations. In general, the understanding of the growth mechanism of any as-... 

Another approach to the direct deposition of platinum onto the membrane surface has been adopted by several workers in exploratory studies of electrochemical processes at the Pt/ionomer membrane interface. Takenaka and Torikai [31] and later Fedkiw and Her [32] and Aldebert and others [33] developed various electroless deposition techniques for the application of a film of platinum to the surface of an ionomeric membrane. The original method suggested by Takenaka and Torikai [31] was based on exposure of one side of the membrane to an anionic salt of the metal... 

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