Poly yield sensitivity

During photolysis, the double bond content of the polysilane(P-l)(15mol% in this experiment) decreased to 10mol%, as measured by 1H-NMR spectroscopy. However, the ratio, quantum yield of scission(Q(S))/quantum yield of crosslinking(Q(X)), was not affected by the reaction of the double bond. West and his coworkers have reported that poly((2-(3-cyclohexenyl)-ethyl)methylsilane-co-methylphenylsilane) crosslinked upon irradiation(55). The difference between our results and West s may lie in the amount of the double bond and inhibitation of the radical closslinking by the phenol moiety. Polysilane with a halogen moiety, P-8, photodecomposed rapidly, compared with P-1 or P-3. The introduction of a chloride moiety was effective for the sensitization of the photodegradation. Similar results has already been reported(55). 

Irradiation at >320 nm releases from the polymer, whether insoluble or water-soluble, free oligosaccharides in very high yields. A simple illustration of such a sequence carried out with either insoluble 2-aminoethyl-substituted poly(acrylamide) beads or with water-soluble, substituted poly(vinyl alcohol) is presented in Scheme 9 the isolated overall yield of lactose was 29.9% (soluble-polymer approach). The synthesis on light-sensitive polymers facilitates the isolation of products, which is important from the preparative point of view and as a tool for the study of enzymes, permitting efficient comparison of acceptor specificity and being capable of demonstrating de novo synthesis. 

The poly (amino acid)s with aromatic side chains behave somewhat differently. In poly(phenylalanine) the a-carbon radical is the major radical species observed, but radicals formed by hydrogen atom addition to the ring are also found. Benzyl radicals formed by side-chain cleavage are present, but only in very low yield. In poly (tyrosine) the only radical species observed is the tyrosyl phenoxyl radical formed by loss of the hydroxyl hydrogen. There is no evidence for formation of significant concentrations of a-carbon radicals. Thus, the nature of the substituents can strongly influence the radiation sensitivity of the backbone chain. 

For further enhancement of electron beam sensitivity, the chlorinated Novolak resin was studied using poly (2-methyl-1-pentene sulfone) as a dissolution inhibitor. The chlorinated Novolak resin mixed well with the polysulfone, and there was no phase separation observed when the films were spin-coated. With 13 wt% of the polysulfone, the chlorinated Novolak resist cast from a cellosolve acetate solution yielded fully developed images with R/Ra = 9.2 after exposure to 2 / 2. It gave fully developed images with R/R0 = 3.2 at a dose of 1 / 2, as shown in Figure 3. There are some problems with this resist system some cracking of the developed resist images... 

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