Poly 8-trichloromethyl

Figure 2. Conflict requirement between the sensitivity and dryetching durability in positive electron resists based on methacrylate polymers. Sputter etching rates were measured under the same conditions using CF, gas. Key 1, poly(p-methoxypheny1 methacrylate) 2, poly(phenyI methacrylate) (PPhMA) 3, poly(3-phenylpropyl meyhacrylate) 4, poly(benzyl methacrylate) 5, poly(p-methoxybenzyl methacrylate) 6, poly(p-fluorophenyl methacrylate 7, poly(trichloropheny1 methacrylate) 8, poly(methyl methacrylate) (PMMA) 9, poly(tert-buty1 methacrylate) 10, poly(ethyl methacrylate) 11, poly(isobutyl methacrylate) 12, poly(n-butyl methacrylate) (PnBMA) 13, poly(dimethyltetrafluoro methacrylate) (FPM) 14, poly(trichloromethyl methacrylate) (EBR-1) and 15, poly(hexafluorobutyl methacrylate) (FBM).

Block copolymers were synthesized by a combination of fipase-catalyzed polymerization and atom transfer radical polymerization (ATRE). " " At first, the polymerization of 10-hydroxydecanoic acid was carried out by using lipase CA as catalyst. The terminal hydroxy group was modified by the reaction with a-bromopropionyl bromide, followed by ATRP of styrene using CuCE2,2 -bipyridine as catalyst system to give the polyester-polystyrene block copolymer. Trichloromethyl-terminated poly(e-CL), which was synthesized by lipase CA-catalyzed polymerization with 2,2,2-trichloroethanol initiator, was used as initiator for ATRP of styrene. 

Bisphenol-AF-derived poly(carbonate) (2) has been synthesized by the two-phase transfer-catalyzed polycondensation of Bisphenol AF (1) with trichloromethyl chloroformate (TCF) in organic-solvent-aqueous-alkaline solution systems with a variety of quaternary ammonium salts at room temperature (Scheme l).6... 

Polymerization of trichloroacetaldehyde in bulk using an optically active initiator gives an isotactic polymer, poly oxy[(trichloromethyl)methylene], of high optical activity owing to the formation of the helical polymer molecules with units of predominantly one chirality sense. 

We have found that a certain number of polyhalogenated aromatic derivatives such as compounds 1-3 greatly accelerate the rate of bleaching of a number of poly silane derivatives in the solid state (33). This effect is dramatically demonstrated in Figure 5 for a PM PS film doped with —20% by weight of l,4-bis(trichloromethyl)benzene, 1. Similar results were obtained with substituted triazine sensitizers such as 2. In these cases, the polysilane is the primary absorber of the incident radiation. Interestingly, when compound 3, which absorbs at —400 nm, was incorporated into a PM PS film and the sample was irradiated at 404 nm, where only the sen-... 

End groups are usually not specified in high polymers. End groups, however, can be known parts of the structure. This can be the case with telomers. Here, the end groups are named as radicals, prefixed by Greek letters, a and co. They appear before and after the name of the polymer. The structure of a telomer, C1-(-CH2-)aHCC13, is therefore called of-chloro-cu-trichloromethyl poly (methylene). 

Poly (hexamethylenebiquanide) hydrochloride microbicide, upholstery Poly (hexamethylenebiquanide) hydrochloride microbicide, wall coverinqs Poly (hexamethylenebiquanide) hydrochloride microbicide, water treatment Bis (trichloromethyl) sulfone 3,5-Dimethyl tetrahydro-2-H,1,3,5-thiadiazone-2-thione microbioloqical control, cuttinq fluids Pentetic acid... 

Figure 4. Melting temperatures (T ) and glass transition temperatures (T ) of poly(3-trichloromethyl 3-propiolactones) (circles) and poly(3 trifluoromethy1-3-methyl 3-propiolactones (triangles).

Poly(2-trichloromethyl-4-methylene-1,3-dioxolane-alt-MA), 321, 327 Poly(trimethylallylsilane-alt-MA), 311 Poly(2,4,4-trimethyl-l-pentene-alt-MA), 338, 586 properties, 433, 436... 

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