Poly photolithography

Revzin A, Russell RJ, Yadavalli VK, Koh WG, Deister C, Hile DD, Mellott MB, Pishko MV. Fabrication of poly(ethylene glycol) hydrogel microstructures using photolithography. Langmuir 2001, 17, 5440-5447. 

Rotello et al. patterned silica substrates with thymine and positively charged poly (vinyl-A -meth y I pyrid i n i u m) (PVMP) polymers by photolithography.74 By... 

A direct solution to this problem would be a buffer layer between the pentacene channel layer and parylene passivation layer. Given that poly(vinyl alcohol) (PVA) has been used as a photo-patternable etch mask for pentacene, it can also work as this buffer layer. After PVA patterning of the pentacene TFT, 1 pm parylene was vapor deposited and patterned by standard photolithography and RIE dry etching. The TFT characteristics were measured before and after the parylene passivation. 

Recent progress has been made in microelectronic device fabrication, particularly in microlithography used to manufacture the high-resolution circuit elements of integrated circuit (Ref. 96). Deep-UV photolithography based on chemically amplified resist is likely to be the first technology that met the severe performance criteria required. The best known chemically amplified resist is based on poly (4-t-butoxycarbonyloxy styrene) or copolymers (Ref. 97). 

Deep UV Photolithography with Composite Photoresists Made of Poly(olefin sulfones)... 

Brittain et al. describe a series of soft lithographic methods that may be suited to the patterning of organic layers [82]. A pattern-transfer element is formed by pouring a liquid polymer, such as poly(dimethylsiloxane), onto a master made from silicon. The polymer is allowed to cure to form an elastomer, which can then be removed from the master. This replica can be used subsequently as a stamp to transfer chemical ink, such as a solution of an alkanethiol, to a surface. Features with dimensions of 40-100 nm can be produced with the technique of near-field, phase-shift photolithography [82]. 

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