Poly exposure characteristics

Table IV compares the X-ray exposure characteristics (at 8.3 X, Al Kai,2 emission line) of the halogenated resists and of PMMA Elvacite 20U1. It can be seen that poly(2-ehloroethyl methacrylates) and poly(2-bromoethyl methacrylates) exhibit a low sensitivity unlike poly(2-fluoroethyl methacrylates) and poly(2-, 2-,2-trifluoroethyl methacrylates) which are more sensitive than PMMA as shown in Figures 2a, 2b, 2c, 2d where the dose-thickness curves of these resists are plotted. The low sensitivity of the PC1EMA and PBrEMA samples may be explained by some competing crosslinking reactions which could occur during exposure as a result of C-Cl and C-Br homolytic bond scissions as noted by Tada...

Table IV. X-ray Exposure Characteristics (at 8.34 A A1 Ka,2 emission line) of the Poly(haIogenoalkyl methacrylates) and of PMMA Elvacite 2041"...

Figure 1 shows the exposure characteristics of atactic and isotactic poly(a,a-dimethylbenzyl methacrylate) resists with CH3ONa development together with those of the poly (methyl methacrylate) resist with MIBK/IPA development. Poly(a,a-dimethylbenzyl methacrylate) s showed high sensitivity and very good contrast between exposed and unexposed areas. The atactic polymer with alkaline development was improved in the sensitivity and 7-value by a factor of more than three over poly(methyl methacrylate) with MIBK/IPA development. 

Figure 1. Exposure characteristics of poly (methyl methacrylate) (PMMA), and atactic and isotactic poly(a,

Table VII the electron-beam exposure characteristics are given for the soluble poly (triphenylmethyl methacrylate-co-methyl methacrylate)s. The sensitivity on alkaline development was strongly influenced by the copolymer composition. The highest sensitivity was obtained on the copolymer containing 93.7 mol% methyl methacrylate. The copolymer of highest sensitivity showed the 7-value of 6.3, which was nearly twice as large as that for poly(methyl methacrylate). Formation of methacrylic acid units on exposure is obvious from the infrared spectrum. However, the mechanism of the occurrence should be different from the case of the a,a-dimethylbenzyl methacrylate polymer since there are no /3-hydrogen atoms in the triphenylmethyl group, and may be similar to the case of poly (methyl methacrylate). This will be explored in the near future.

In Table 1, the moisture uptake of cured and uncured Navy P3-2300-PE resin after 24 hours of immersion is compared to a number of other high-temperature polymer resins. The moisture uptake of the Navy P3 oligomer is nearly identical to that of the commercial P3 thermoplastic. Other commercial thermoplastics, such as poly(ether ether ketone), with very similar chemical compositions, exhibit similarly low levels of moisture uptake. On the other hand, the Navy P3 resins absorbs about 85% less water than the commercial polyimide Kapton HN. Since thermosetting phenyl ethynyl end-capped polyimides have moisture uptake characteristics that are similar to Kapton HN, with around 3% weight gain on exposure to 95% relative humidity (77), void-free composites based on Navy P3 resins should exhibit greatly reduced moisture uptake compared to those based on thermosetting polyimides. 

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