Plasma organic film, properties

The deposition of organic films by plasma polymerization is an important application of non-thennal plasmas 1301. Plasma polymers are fonned at the electrodes and the walls of electrical discharges containing organic vapours. Oily products, soft soluble films as well as hard brittle deposits and powders are fonned. The properties of plasma... 

Infrared Spectrum. The plasma polymerized organic film shows features distinctive from the conventional polymer. According to ESR measurements (31), the film contains a high concentration of residual free radicals, which showed a relatively long life time. The free radicals were oxidized in air and the oxidization is promoted significantly at elevated temperatures. The film is not soluble in usual solvents and it is more thermally stable than the conventional polymers. These properties are thought to be caused by the highly crosslinked structure of the film (32). 

Although to-date the emphasis has been on plasma polymerized films produced from hydrocarbon based systems, this trend in more recent times has swung towards fluorocarbons in an attempt to produce polymers of similar properties to conventionally prepared linear fluoropolymers. However, it will become clear from the account to follow that in many respects plasma polymerized fluorocarbons differ significantly from their linear counterparts. It is to the plasma polymerization of organic monomers containing solely carbon and fluorine therefore that we shall devote our attention in this section with only brief references to hydrocarbon and fluorohydrocarbon polymers for comparison purposes. 

The incorporation of metals into thin organic polymer films gives rise to a new class of so-called hybrid films with interesting physical, chemical, medical, and electrical properties. E. Kay [90-92] introduced the principal methods of metal-incorporation into organic matrices research of composite plasma polymer films with metal grains dispersed in the organic polymer has since been pursued actively. 

Experiments like those described above have been performed to evaluate sodium ion barrier properties of Hitachi PIQ and DuPont PI 2540 polyimide films. Also included in the comparison were silicon nitride coatings plasma deposited in both tensile and compressive stress modes. The structure of the samples is illustrated in Figure 9. N-type, (111) oriented silicon substrates were cleaned and oxidized in dry oxygen ambient at 1100°C to form a 1060 A Si02 film. Wafers intended for polyimide characterization were coated with an organic silane film (gamma glycidal amino propyl trimethoxysilane) to promote adhesion of the polyimide to the oxide surface. The polyimide resins were spun onto the wafers at speeds to produce final... 

Plasma polymers are deposited on surfaces in contact with a glow discharge of organic or organometallic monomers, in the form of a thin film and/or as a powder. Such films find applications as surface modifiers and in applications where the bulk properties of extremely thin films are desirable. 

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