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Shape pitch contour

A major impediment to pitch contour analysis is that pitch contour shape has traditionally been analysed qualitatively using human raters (e.g. Femald and Simon, 1984). There have recently been several attempts to find reliable quantitative methods, but no single approach has emerged as either simple in its execution or capable of being applied to a wide variety of speech types. For instance, Trainor et al. (2000) used measurements of pitch values at prespecified points within a contrived stock phrase. This approach was unable to provide a sensitive characterization of pitch contours. By contrast, Moore et al. (1994) successfully applied mathematical modelling to the problem. Then-approach would potentially allow a wide variety of speech types to be addressed, but the complexity of their approach seems to have prevented its wide acceptance within psychology. [Pg.301]

For rayon fiber based composites (Sections 3 and 4) the fiber and powdered resins were mixed in a water slurry in approximately equal parts by mass. The isotropic pitch carbon fiber composites (Section 5) were manufactured with less binder, typically a 4 1 mass ratio of fiber to binder being utilized. The slurry was transferred to a molding tank and the water drawn through a porous screen under vacuum. In previous studies [2] it was established that a head of water must be maintained over the mold screen in order to prevent the formation of large voids, and thus to assure uniform properties. The fabrication process allows the manufacture of slab or tubular forms. In the latter case, the cylinders were molded over a perforated tubular mandrel covered with a fine mesh or screen. Moreover, it is possible to mold contoured plates, and tubes, to near net shape via this synthesis route. [Pg.193]

Therefore the shape of the distribution will be variable on the arcmin scale. The degradation of source location accuracy caused by loss of the shadow-gram contours could be reduced by choosing a collimator pitch larger than the mask element. In this case, however, off-axis sources may induce artifacts in the image, the spatial distribution of which depends on the particular mask design chosen. The normalized rms, associated to this systematic noise, increases with both the ratio between the sizes of the collimator ceU and the mask element, and the source offset angle. [Pg.154]

In general, by inherent properties, we mean ffie shape of the FO contour of the pitch accent. To a degree, we can separate the FO pattern of the pitch accent from the surrounding contour, but... [Pg.237]


See other pages where Shape pitch contour is mentioned: [Pg.299]    [Pg.300]    [Pg.301]    [Pg.301]    [Pg.308]    [Pg.299]    [Pg.300]    [Pg.301]    [Pg.301]    [Pg.308]    [Pg.238]    [Pg.235]    [Pg.299]    [Pg.301]    [Pg.302]    [Pg.303]    [Pg.303]    [Pg.304]    [Pg.305]    [Pg.307]    [Pg.266]    [Pg.852]    [Pg.222]    [Pg.152]    [Pg.435]    [Pg.246]    [Pg.249]    [Pg.243]    [Pg.246]    [Pg.552]   


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