Photosensitive chemical reactions

Modeling the Self-Assembly of Ternary Blends that Encompass Photosensitive Chemical Reactions Creating Defect-Free, Hierarchically Ordered Materials... 

Chapter 8 details the modeling of the self-assembly of ternary blends encompassing photosensitive chemical reactions that create defect-free, hierarchically ordered materials. Starting with a brief review of literature, this chapter provides a description of theoretical models and then shows how one can control the evolution of such systems by varying the reaction rate coefficients in a specified manner. A further discussion on the formation of defect-free structures in the binary and ternary systems via a combination of stationary and moving light sources is given. Then, description is provided on the use of a photomask to control the structure formation within thin films of ternary blends. 

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