Photoresist technology polysilanes

Dehydrogenative Coupling of Hydride Functional Silanes. The autocouphng of dihydridosilanes was first observed usiag Wilkinson s catalyst (128). A considerable effort has been undertaken to enhance catalyst turnover and iacrease the molecular weight of polysilane products (129) because the materials have commercial potential ia ceramic, photoresist, and conductive polymer technology. 

Two types of new silicon-branched organosilicon polymers, linear and ladder polysilane structures, were produced from dihalo- and tetrahalodisilane, respectively, via alkali-metal-mediated reactions. Further investigations disclosed that the polymers may he useful as photoresists, semiconductors, ceramic precursors, and composite materials in high-technology fields. 

The facile cleavage of Si-Si bonds by UV radiation is also made use of in the application of polysilanes as photoresists. This application has been weU studied [107-110]. The technology covers a wide range from the structuring of metal films to the fabrication of micro lenses. 

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