Photolithography, technological

As glass and quartz exhibit the same surface property as fused-silica capillary, the monolithic materials could be conveniently prepared in a glass- or quartz-based microfluidic device via the same way of monoliths in the capillary. However, glass/quartz devices are rather expensive, and the need for specialized facilities for their fabrication with conventional photolithography technology hinders any rapid modification of the chip architecture. An attractive alternative is using a variety of polymeric materials, such as poly(dimethylsiloxane) (PDMS), poly(methyl methacrylate) (PMMA), polycarbonate (PC), and cyclic olefin copolymer (COC), to fabricate microchips for their mechanical and chemical properties, low cost, ease of fabrication, and high flexibility. 

A microversion of the Linde heat exchanger is produced commercially by MMR Technologies [35], It consists of glass plates which are etched by photolithography to produce fine channels of 200 xm width and 30 p,m depth. The plates are then bonded together and the gas streams circulate through these fine channels. 

The continual progress in VLSI device development is placing increasing demands on the lithographic technologies used for their manufacture. At the present time, almost all commercial devices are made by photolithography utilizing... 

The radiation sources employed in microlithography include conventional (>300 nm) and deep-UV (<300 nm) light, electron-beam, ion-beam and x-ray sources. By far the predominant lithographic technology is conventional photolithography which... 

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