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Photochemical addition polysilane

The activation of silylene complexes is induced both photochemically or by addition of a base, e.g. pyridine. A similar base-induced cleavage is known from the chemistry of carbene complexes however, in this case the carbenes so formed dimerize to give alkenes. Finally, a silylene cleavage can also be achieved thermally. Melting of the compounds 4-7 in high vacuum yields the dimeric complexes 48-51 with loss of HMPA. The dimers, on the other hand, can be transformed into polysilanes and iron carbonyl clusters above 120 °C. In all cases, the resulting polymers have been identified by spectroscopic methods. [Pg.27]

Regarding this proposal, it should be noted that while 1,1-eliminations on Si-Si-C units to generate silylenes are well known thermal processes (54) the photochemical variant seems not to have been described. The rearrangement of silylsilylenes (4) to disilenes is known to be rapid (55), and silyl radical addition at the least hindered site would produce the observed persistent radical. Preliminary evidence for the operation of 1,1-photoelimination processes in the polysilane high polymers has been obtained, in that the exhaustive irradiation at 248 nm of poly(cyclohexylmethylsilane) (PCHMS) produces —10-15% volatile products which contain trialkylsilyl terminal groups. For example, the following products were produced and identified by GC— MS (R=cyclohexyl,R = methyl) H(RR Si)2H (49%), H(RR Si)3H (19%), R2R SiH (2%), R 2RSiRR SiH (5%) and R2R SiRR SiH (7%). [Pg.122]

In addition, mechanistic studies of the photochemical reactions are necessary to determine whether similar processes occur in the solid state. Polymer chain scission is usually the predominant process in the solid state, although cross-linking reactions become more important in the presence of pendant unsaturation. However, little is known about the nature of the intermediates produced in the solid state. Information of this type is important, because most of the applications of polysilane derivatives require the materials as solid films. [Pg.455]


See other pages where Photochemical addition polysilane is mentioned: [Pg.93]    [Pg.10]    [Pg.62]    [Pg.1317]    [Pg.1318]    [Pg.235]    [Pg.171]    [Pg.217]    [Pg.423]    [Pg.434]    [Pg.1230]    [Pg.1317]    [Pg.205]   
See also in sourсe #XX -- [ Pg.200 ]




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