Particulate and Film-type Surface Contamination

Metrology and contamination analysis in particular have been decisive factors for profitable semiconductor production [4.47]. Semiconductor applications of TXRF go back to the late nineteen-eighties and were introduced by Eichinger et al. [4.48, 4.49]. Because of its high sensitivity, wide linear range, facile spectrum deconvolution, and 

Detection limits for various elements by TXRF on Si wafers are shown in Fig. 4.13. Synchrotron radiation (SR) enables bright and horizontally polarized X-ray excitation of narrow collimation that reduces the Compton scatter of silicon. Recent developments in the field of SR-TXRF and extreme ultra violet (EUV) lithography nurture our hope for improved sensitivity down to the range of less than 10 atoms cm  

Ni standard reference sample. When the X-ray intensity sinks below 75% of the original intensity, the tube must be replaced with a new one. 

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