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Optical materials used lithography

M. H. Wu and G. M. Whitesides, "Fabrication of diffractive and micro-optical elements using microlens projection lithography," Advanced Materials, vol. 14, pp. 1502-1506, Oct 2002. [Pg.7]

Excimer lasers are of great importance for UV and vacuum UV (VUV) spectroscopy and photochemistry. They are also found in a wide range of applications. For example, they are used in micromachine medical devices, including refractive surgery, in photo-lithography for the microelectronics industry, for material processing, as optical pump sources for other type of lasers (dyes), and so on. More details about excimer lasers can be found in Rodhes (1979). [Pg.54]

See other pages where Optical materials used lithography is mentioned: [Pg.649]    [Pg.481]    [Pg.254]    [Pg.152]    [Pg.202]    [Pg.1202]    [Pg.203]    [Pg.35]    [Pg.196]    [Pg.338]    [Pg.483]    [Pg.226]    [Pg.481]    [Pg.480]    [Pg.482]    [Pg.65]    [Pg.164]    [Pg.166]    [Pg.616]    [Pg.629]    [Pg.708]    [Pg.2]    [Pg.92]    [Pg.2702]    [Pg.1283]    [Pg.254]    [Pg.65]    [Pg.590]    [Pg.366]    [Pg.217]    [Pg.23]    [Pg.114]    [Pg.300]    [Pg.212]    [Pg.104]    [Pg.15]    [Pg.380]    [Pg.338]    [Pg.392]    [Pg.393]    [Pg.372]    [Pg.575]    [Pg.126]    [Pg.252]    [Pg.7]    [Pg.46]    [Pg.746]   
See also in sourсe #XX -- [ Pg.649 ]



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