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Nonepitaxial growth

Figure 38 shows the XRD pattern (a) and hysteresis loop (b) of FePt C double-layered nanocomposite thin-film medium. The soft underlayer FeCoNi (111) peak and the Zl0 FePt (001) and (002) peaks are shown only in the XRD pattern. This means that the preferred crystal orientation of Tl0 FePt C nanocomposite film is successfully obtained on this SUL by nonepitaxial growth. The polar-Kerr measurement shows a square loop that is only sensitive to the top layer the Kerr effect data shown in this loop give the coercivity Hc = 8.5 kOe, nucleation field Hn = 5.65 kOe, remanence ratio S = 1, and loop slope ( at Hc) a = 3.3, respectively. [Pg.235]

FIGURE 2.12 Schematic of nonepitaxial growth of hybrid core-sheU nanostructures with substantial lattice mismatches. Reprinted with permission from Ref. [55]. American Association for the Advancement of Science. See insert for color representation of the figure.)... [Pg.22]

For an example of a careful analysis of crystal growth of Ti02, see Ref [38]. Another type of microstructure refers to films the structure of which depends on the orientation of the metal grains, for example, in case of Ti [37, 38], Zr [39, 40], Ta [40] and A1 [41]. Amorphous films do not have a structure and are nonepitaxial. In case of Zr, epitaxial growth of oxide was observed by AME [39]. [Pg.224]

The fabrication of the conventional microlasers requires expensive state-of-the-art crystal growth and microfabrication facilities. The realization of lasing in semiconductor polycrystalline films, which are nonepitaxially grown on amorphous fused silica substrates, provides a possibility to fabricate semiconductor lasers on many different types of substrates. As a result, fabrication of such a polycrystalline film-based microlaser is much easier and less expensive than that of most microlasers. In this context, development of methods for growing high-quality polycrystalline ZnO films is important, because polycrystalline ZnO films also have many other applications as phosphors, coatings, and so on in various devices [166]. [Pg.205]


See other pages where Nonepitaxial growth is mentioned: [Pg.128]    [Pg.123]    [Pg.231]    [Pg.131]    [Pg.2452]    [Pg.128]    [Pg.123]    [Pg.231]    [Pg.131]    [Pg.2452]    [Pg.206]    [Pg.5857]   
See also in sourсe #XX -- [ Pg.82 , Pg.206 ]




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