Negative SIMS profile

Fig. 6. Negative SIMS profile of steroid glucuronides from a 21-hydroxylase deficiency urine. [Reproduced with permission from ref. (106)]...

Dopant levels in the plated copper film were determined by Secondary Ion Mass Spectrometry (SIMS). SIMS profiles were measured with a Cameca ims-5f tool using 14.5 keV cesium primaries, negative ion detection, and sufficient mass resolution to separate S from O2. Quantification was done using ion implant references of 13C, lsO, and 35C1 into copper with S being in arbitrary units. A nominal copper density of 8.92 g/cc was used to convert to units of parts per million by weight (ppmw). 

Negative polyatomic SIMS profiles (a) for a 1.4pm thick chromium oxide (Cr203) film formed on a (100) chromium single crystal at 825°C (1.1 pm of oxide produced in followed by 0.3 pm produced in 02) (b) expanded Cr 0 profile for a Cr203 film formed on polycrystalline chromium at 825°C showing the location of the 0-oxide at the metal/oxide interface as a result of the surface pretreatment. Sputtering was by 4 keV xenon. (From Hussey et at. [101.)... 

Aqueous corrosion profiles have also been measured on soda-lime-silica glasses using SIMS.(18) Both negative and positive oxygen primary ions were used for sputtering in combination with a metal diaphragm to minimize charging. 

Fig. 7.3 ToF-SIMS depth profiles (negative ions) of Si nanowire electrodes, cycled in a Li metal cell with 1 M LiPF s in 1 1 EC DMC. Reproduced with permission from [63] copyright 2(X)6,...

FIGURE 42.28 Negative ToF-SIMS depth profile obtained with 200 eV Cs ion sputtering of a PC layer deposited on a silicon substrate, reconstructed over a uniform region of interest. Figure from Reference [343]. 

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