Nanostructures Fabricated Using Nanolithographic Top-Down Techniques

3 Nanostructures Fabricated Using Nanolithographic (Top-Down) Techniques 

This approach is generally classified as top-down and mainly covers the preparations of highly ordered metallic nanostructures by electron beam lithography (EBL) and chemical etching techniques. 

Using EBL and IBL maskless techniques, an array of highly ordered structures is produced by a focused electron or ion beam drawing patterns over the resist wafer in a serial manner with nanometre resolution (Kahl et al. 1998). The scheme for two fabrication strategies for SERS substrates using EBL is shown in Fig. 3.9. The left 

3 Basics of Surface-Enhanced Raman Scattering (SERS) 

It is necessary to note that EBL and IBL methods generally suffer from high cost, long preparation times (several days) and a need for specialized equipment. The cost and preparation time can be much lower with the use of a template techniques discussed in Sect. 3.4.4. 

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