Monomers, organosilicon

Coating compositions for this process can contain cyclic ethers, vinyl ether monomers, organosilicone monomers, and a wide variety of mono-, di-, and polyepoxy functional materials. Further modifications to this process include the addition of free radical polymerizable monomers in combination with the cationic polymerizable monomers so that both curing processes may take place at the same time. The photoinitiator systems that generate acid catalyst intermediates also generate free radical intermediates or can be combined with other photosensitizer materials such that both... 

A. D. Petrov, B. E. Mironov, V. A. Ponomarenko, and E. A. Chernyshev, Synthesis of Organosilicon Monomers, Consultants Bureau, New York, 1964,... 

V. M. Mikhaylov and V. N. Penskh, Production of Monomer and Polymer Organosilicon Compounds, English transL, No. AD-779129, NTIS, U.S. Dept, of Commerce, Springfield, Va., p. 18. 

Oligonucleotides 147 Oligopeptides 159 Oligophenylalanines 159 Organosilanes 160, 161 Organosilicon modifiers 136 Oxyrane monomers 163... 

The polymerizations initiated by HMDS and N-TMS amines usually complete within 24 h at ambient temperature with quantitative monomer consumption. These polymerizations in general are slower than those mediated by Deming s Ni(0) or Co (0) initiators (about 30-60 min at ambient temperature) [19, 24, 25], but are much faster than those initiated by amines at low temperature or using amine hydrochloride initiators [20]. These HMDS and N-TMS amine-mediated NCA polymerizations can also be applied to the preparation of block copolypeptides of defined sequence and composition [22]. This organosilicon-mediated NCA polymerization, which was also shown by Zhang and coworkers to be useful for controlled polymerization of y-3-chloropropanyl-L-Glu NCA [43], offers an advantage for the preparation of polypeptides with defined C-terminal end-groups. 

In 1957 (2) platinic, ruthenium, and iridium chlorides were shown to be catalysts leading to very rapid additions, sometimes below room temperature, of many kinds of SiH compounds. These findings initiated much activity, chiefly in industrial research laboratories, in several countries, because they indicated that the manufacture of new organosilicon monomers and many new silicone polymers and copolymers would become commercially practicable for the first time. 

There is a current drive in microlithography to define submicron features in bilevel resist structures. The introduction of organometallic components, most notably organosilicon substituents, into conventional resists is one promising approach. To this end, organosilicon moieties have been primarily utilized in starting monomers (1-4) or in post-polymerization functionalization reactions on the polymer (5,6). Little work has been done on the reaction of preformed reactive oligomers to synthesize block copolymer systems. 

OrganometaUic compounds, of transition metals as catalysts for polymerization of vinyl monomers and olefins, 23 263-325 OrganometaUic transformation, molecular analogs, 38 288, 290-291 Organophosphorus substrates, hydrolysis of, effect of cycloamyloses on, 23 235 Organosilicon compounds, hexacoordinated, 34 155... 

Co-condensation of organosilicon monomers and/or oligomers of different structure and composition. 

Co-condensation of Organosilicon Trifunctional Monomers and/or Oligomers of Different Structure and Composition... 

For general reviews concerning ROMP see Refs. [59,180,181 ], and for synthesis from organosilicon monomers. 

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