Metalorganic chemical vapour deposition

The thermal decomposition of Cp substituted silicon compounds with the elimination of pentamethylcyclopentadiene (Cp I I) turns out to be synthetically very useful. As shown in equations 43-45, extreme conditions are necessary to selectively cleave the respective Si—C(Cp ) bond94-96. In this context, it is important to mention the use of cyclopentadienyl silicon compounds in the metalorganic chemical vapour deposition (MOCVD) process or in related techniques95,96. 

III-V nitride films were grown by the two-flow metalorganic chemical vapour deposition (MOCVD) method, details of which are described elsewhere [1]. The growth was conducted at atmospheric pressure. Sapphire with (0001) orientation (C-face), of two-inch diameter, was used as a substrate. 

J. P. Gorrichon, and A. Gleizes, Preliminary Study of (Ni(en)3) (CP3CO,), and Ni(en) (hfpd)2 as Precursors for Metalorganic Chemical Vapour Deposition, Structural Properties and Thermal Behaviors, Inorganica Chimical Acta, Vol.248, 1996, pp.15-21. 

Dudek, L. (2011). Plasma Polymer Electrolyte Coatings for 3D Microbatteries, In IGERT 2011 Poster Competition, Available from Ennajdaoui, A. Roualdes, S. Brault, P. Durand, J. (2010). Membranes Produced by Plasma Enhanced Chemical Vapor Deposition Technique for Low Temperature Fuel Cell Applications. /. Power Sources, Vol. 195, pp. 232-238 Fonseca, J.L.C. Apperley, D.C. Badyal, J.P.S. (1993). Plasma Polymerization of Tetramethylsilane. Chem. Mater., Vol. 5, pp. 1676-1682 Fujii, E. Torii, H. Tomozawa, A. Takayama, R. Hirao, T. (1995). Preparation of Cobalt Oxide Films by Plasma-Enhanced Metalorganic Chemical Vapour Deposition. /. Mater. Set, Vol. 30, pp. 6013-6018... 

In recent years, a number of coating process technologies have been developed, based on chemical vapour deposition (CVD), such as metalorganic precursor CVD [32] and plasma enhanced CVD (PECVD) [33], as alternative techniques to deposit columnar structures. Results reported so far, while promising, do not seem to offer a significant improvement in performance or durability over... 

The chemical vapour deposition is discussed here as Metalorganic vapour phase epitaxy and Electrostatic spray assisted vapour deposition. 

Matarial Science.- Relevant review articles are the use of metalorganic precursors for vapour phase epitaxy, precursor requirements for the growth of GaAs and AlGaAs by chemical beam epitaxy,and the use of aluminium-nitrogen compounds for AIN deposition.203... 

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