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Metal deposition optical spectroscopy

Such effects are observed inter alia when a metal is electrochemically deposited on a foreign substrate (e.g. Pb on graphite), a process which requires an additional nucleation overpotential. Thus, in cyclic voltammetry metal is deposited during the reverse scan on an identical metallic surface at thermodynamically favourable potentials, i.e. at positive values relative to the nucleation overpotential. This generates the typical trace-crossing in the current-voltage curve. Hence, Pletcher et al. also view the trace-crossing as proof of the start of the nucleation process of the polymer film, especially as it appears only in experiments with freshly polished electrodes. But this is about as far as we can go with cyclic voltammetry alone. It must be complemented by other techniques the potential step methods and optical spectroscopy have proved suitable. [Pg.14]

Until quite recently the very initial stages of metal deposition were difficult to characterize in detail by structure- and morphology-sensitive techniques. As a consequence and for practical purposes - multilayers were more useful for applications than monolayers - the main interest was focussed onto thick deposits. Optical and electron microscopy, ellipsometry and specular or diffuse reflectance spectroscopy were the classic tools, by which the emerging shape of the deposit was monitored [4-7],... [Pg.108]

The initial stages, notably the formation of a monolayer on a foreign substrate at underpotentials, were mainly studied by classical electrochemical techniques, such as cyclic voltammetry [8, 9], potential-step experiments or impedance spectroscopy [10], and by optical spectroscopies, e.g., by differential reflectance [11-13] or electroreflectance [14] spectroscopy, in an attempt to evaluate the optical and electronic properties of thin metal overlayers as function of their thickness. Competently written reviews on the classic approach to metal deposition, which laid the basis of our present understanding and which still is indispensable for a thorough investigation of plating processes, are found in the literature [15-17]. [Pg.108]

Complete characterization of poisoned catalysts, of course, requires much more than chemical analysis. For example, the interaction of poisons with catalyst constituents and with each other has been studied by X-ray diffraction and by electron microscopy, the morphology of the poison deposits by optical methods, the distribution within the catalyst pellets and washcoats by the microprobe, and the distribution of poison on the surface of the active metals by Auger spectroscopy. [Pg.318]

Fig. 1. Schematic representation of vacuum furnace closed-cycle helium refrigeration system used for metal vapor microsolution optical spectroscopy, as well as conventional metal vapor-matrix isolation experiments. (A) NaCl or Suprasil optical window, horizontal configuration (B) stainless steel vacuum shroud (C) NaCl or Suprasil optical viewing ports (D) cajon-rubber septum, liquid or solution injection port (E) gas deposition ports (F) vacuum furnace quartz crystal microbalance assembly. With the optical window in a fixed horizontal configuration, liquid or solution sample injection onto the window at any desired temperature in the range 12-300 K is performed in position 1A, metal deposition is conducted in position IB, and optical spectra are recorded in position 1C see Procedure). Fig. 1. Schematic representation of vacuum furnace closed-cycle helium refrigeration system used for metal vapor microsolution optical spectroscopy, as well as conventional metal vapor-matrix isolation experiments. (A) NaCl or Suprasil optical window, horizontal configuration (B) stainless steel vacuum shroud (C) NaCl or Suprasil optical viewing ports (D) cajon-rubber septum, liquid or solution injection port (E) gas deposition ports (F) vacuum furnace quartz crystal microbalance assembly. With the optical window in a fixed horizontal configuration, liquid or solution sample injection onto the window at any desired temperature in the range 12-300 K is performed in position 1A, metal deposition is conducted in position IB, and optical spectra are recorded in position 1C see Procedure).
Reflection spectroscopy, Raman spectroscopy, and ellipsometry complement the various electrochemical methods to study metal deposition. The optical methods can be used for a direct monitoring of the deposition process. The great advantage of optical spectroscopy... [Pg.223]


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