Masked allylic amines

Allylic and homoallylic amines in which the nitrogen atom is masked with two Boc groups provide valuable building blocks for synthesis not only because of the multiple functionalities after AD, but also because the two hydroxyl groups emerge in differentiated forms in the products. The proximal oxygen atom becomes part of an oxazolidinone system. ... 

It has been shown that allyl-amino substituted polyphosphazenes, specifically tailored to form glassy films from suitable solvents can be used for negative resist/mask applications for microlithography. As suggested by model studies, the addition of allylic double bonds to amino-substituted polyphosphazenes increases the sensitivity to radiation-induced crosslinking. However, it is probable that the stabilizing influence of the hindered amine substituent has reduced the graftabflity of these polymers. In addition, the inherent RIE resistance of the phosphazene family has been demonstrated, which underscores the possible usefulness of these systems for future resist work. Currently, other related... 

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