Main group elements electrodeposition

There has been an increasing number of studies of the UPD of main group elements, including S, Se, Te, I, Br, Cl, and As, on metal substrates, whereas studies of UPD processes on the surface of semiconductors and semimetal substrates are significantly less. Presently, most interesting in this connection is the combined use of photoexcitation of a semiconductor substrate and/or an immobilized precursor, and electrodeposition, as will be discussed in a subsequent paragraph. 

Electrodeposition of Main Group Elements and Transition Metals. The electrodeposition of tellurium, Te, has been investigated in an acidic EMlCl-ZnCl2 ionic liquid [84]. Tellurium tetrachloride, TeCLi, is soluble in the ionic liquid. The electrodeposition of metallic tellurium occurs at around 1 V vs. Zn/Zn(II). The formation of the Zn-Te alloys also occurs at more negative potentials. The further reduction of metallic tellurium to Te(—11) is reported as well just as in the chloroaluminate ionic liquid. 

A series of transition- and main group-metal-containing ionic liquids have been formulated and the feasibility of achieving electrodeposition has been demonstrated for the majority of these metals, Figure 1.1 shows the elements in the periodic table that have been deposited using ionic liquids. Details of these systems are given in the subsequent chapters and concise summaries exists in recently published reviews [18,25,26]. 

Elemental gallium has been electrodeposited from chlorogallate ionic liquids formed between [EMIM]Q and GaClj [112], The direct electrodeposition of GaAs from ionic liquids was studied mainly by two groups. Wicelinski et al. [113] used an acidic chloroaluminate liquid to co-deposit Ga and As. However, it was reported... 

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