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Magnetically soft films

The substrate was also found to influence the properties of the electrolessly deposited vertical media CoNiMnP, CoNiReMnP, and CoNiReP. The c-axis orientation had a larger degree of perpendicular orientation for films deposited on electroless NiP than for those deposited on Cu foil, presumably because of the smaller roughness of the former substrate [43]. The double-layer (magnetically soft interface, magnetically hard bulk) properties of CoNiReP deposited on a NiMoP underlayer [57] have already been discussed. [Pg.264]

Films of CoB have been prepared by electroless deposition. Chang et al. [25] deposited magnetically soft amorphous films, which could be annealed to give materials with an Hc of 250 Oe. Depending on the annealing temperature, the films crystallized as the hep or fee modifications of Co. Matsui and co-workers [22] obtained crystalline materials in the as-deposited state, the crystalline characteristics being determined by processing conditions. A maximum HQ of 300 Oe was observed for films with 10.0 preferred orientation. [Pg.307]

The process flow for the thin-film head is shown in Fig. 6.6 [6]. The Cu coils, Cu lead, Au pad, and the core of the soft magnetic thin films in the head are prepared by electrodeposition. These metal parts require a high-aspect ratio. Also, the method... [Pg.71]

Design of Soft Magnetic Thin Films with High B... [Pg.74]

Fig. 6.11 Design of a microstructure for soft magnetic thin films with high and high p. Fine grain with high is separated by high p materials... Fig. 6.11 Design of a microstructure for soft magnetic thin films with high and high p. Fine grain with high is separated by high p materials...
In Fig. 6.12, the film contains an intermediate layer for suppressing the eddy current loss. Insulators such as SiO and Al Oj are widely used for the intermediate layer, and the formation of films such as FeAIN/AljOj [44], FeTaN/AIN [45], have been reported. Soft magnetic thin films with high resistivity and a low value are used for the intermediate layer instead of an insulator, because of the small decrease in value of Fe(Fe-C)/CoNbZr [43,46] and FeRhN/CoZrCr [47] films have also been reported. [Pg.77]

High-Performance Soft Magnetic Alloy Films Prepared by Electrodeposition... [Pg.77]

Soft magnetic thin films with high B and/or high p prepared by electrodeposition are shown in Fig. 6.13. Soft magnetic films prepared by electroless deposition are also discussed in this section. [Pg.77]

Takai M (1997) Electrochemical preparation of soft magnetic CoNiFeS film with high saturation magnetic flux density and high resistivity. J Electrochem Soc 144 L203-L204... [Pg.83]

Yokoshima T et al (2000) Electroless CoNiFeB soft magnetic thin films with high corrosion resistance. J Electroanal Chem 491 197-202... [Pg.83]

Osaka T et al (1998) A soft magnetic CoNiFe film with high saturation magnetic flux density and low coercivity. Nature 392 796-798... [Pg.83]

Tabakovic I et al (2000) Organic additives in the electrochemical preparation of soft magnetic CoNiFe films. J Electrochem Soc 147 219-226... [Pg.83]

Osaka T (2001) Effects of impurities on resistivity of electrodeposited high-B CoNiFe-based soft magnetic thin films. IEEE Trans Magn 37 1761-1763... [Pg.86]

Osaka T et al (2003) A high moment CoFe soft magnetic thin film prepared by electrodeposition. Electrochem Sohd State Lett 6 C53-C55... [Pg.86]

Yokoshima T et al (2004) Preparation of high-B, Co-Fe soft magnetic thin films by electrodeposition. IEEE Trans Magn 40 2332-2334... [Pg.86]

See other pages where Magnetically soft films is mentioned: [Pg.34]    [Pg.258]    [Pg.261]    [Pg.308]    [Pg.171]    [Pg.164]    [Pg.119]    [Pg.132]    [Pg.167]    [Pg.33]    [Pg.270]    [Pg.366]    [Pg.366]    [Pg.367]    [Pg.381]    [Pg.84]    [Pg.68]    [Pg.71]    [Pg.71]    [Pg.74]    [Pg.74]    [Pg.75]    [Pg.76]    [Pg.76]    [Pg.76]    [Pg.78]    [Pg.79]    [Pg.80]    [Pg.82]    [Pg.89]   


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Films magnetic

Soft magnets

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