Lithography nanoimprint technology

The ability to fabricate nanostructures is essential to modem science and technology [1], Nanoimprint lithography (NIL) in its various forms has demonstrated potential applications in the fabrication of semiconductor devices, microfluidic devices, optical components, photonic devices, replica mold components and biological objects [2],... 

Taniguchi, J., Koga, K., Kogo, Y, and I. Miyamoto. 2006. Rapid and three-dimensional nanoimprint template fabrication technology using ion beam lithography. Microelectronic Engineering 83 940-943. 

As we have demonstrated previously, the inscription in the ITRS is not something neutral, because it has implications for the scientific and technological objectives to be pursued. What are the consequences at the level of laboratory practice Beyond the general orientation of the investigation, it is important to understand that the inscription in the ITRS also modifies the technical characteristics that have to be considered in the research activity. More precisely, it means that crucial properties of the nanoimprint lithography are therefore re-qualified , and that the requalification process constitutes an important form of heterogeneous engineering that occurs in the MNT laboratory. 

The greatest progress has been made in the research of the components that may make up nanoelectronics. Researchers have been able to fabricate molecules that have two states, such that the molecules can be switched on and off . Some of these molecules have shown the functionality of diodes or variable resistors. Scientists have also been able to fabricate silicon nanowires and carbon nanomaterials such as one-dimensional (ID) carbon nanotubes (CNT) or two-dimensional (2D) graphene layers. Both of these technologies can be used as wires or devices, and in some cases both. Nanoimprint lithography, probably the most promising wire fabrication technique, has been used to produce working memories on the nanometer scale. While all of these... 

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