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Light multilayer polymer

Multilayer polymer window in currency that diffracts light in a particular pattern... [Pg.422]

Tseng. S. -R. Meng. H. -F. Lee. S. -F. (2008). Multilayer polymer light-emitting diodes by blade coating method. Applied Physics Letter, vol. 93, no. 15,153308-1-3. [Pg.124]

Gong X, Wang S, Moses D, Bazan G C and Heeger A J, Multilayer Polymer Light-Emitting Diodes White-Light Emission with High Efficiency Advanced Materials,, 17, 17,(September, 2005),2053-2058... [Pg.217]

Gong, X., Wang, S., Moses, D., Bazan, G.C., Heeger, A.I., 2005. Multilayer polymer Ught-emitting diodes white-light emission with high efficiency. Adv. Mater. 17, 2053-2058. [Pg.281]

Phospholipids, phosphatidylcholines, have been synthesized which contain the diacetylene group in their acyl chains. These lipids may be dispersed in water or deposited in Langmuir-Blodgett multilayers and their polymerisation initiated with ultraviolet light. The polymers are optically active and thermochromic. A similar polymerisation can be initiated in the membranes of microorganisms which have been grown in the presence of diacetylenic fatty acids. [Pg.371]

GON 05] Gong X., Wang S., Moses D. et al, Multilayer polymer light-emitting diodes white-light emission with high efficiency , Advanced Materials, vol. 17, no. 17, pp. 2053-2058, 2005. [Pg.173]

TSE 06] Tseng S.-R., Lin S.-C., Meng H.-F. et al, General method to solution-process multilayer polymer light-emitting diodes . Applied Physics Letters, vol. 88, no. 163501,2006. [Pg.179]

Studies of the waveguiding of light in multilayers of certain polymers showed that it is possible to propagate light with an attenuation that is still large compared to many other materials but small compared to other LB materials... [Pg.2619]

Polymer films that are sensitive to light, x-rays, or electrons— known as photoresists—are nsed extensively to transfer the pattern of an electronic circuit onto a semiconductor surface. Such films must adhere to the semiconductor surface, cross-link or decompose on exposure to radiation, and nndergo development in a solvent to achieve pattern definition. Virtually all aspects of photoresist processing involve surface and interfacial phenomena, and there are many outstanding problems where these phenomena mnst be controlled. For example, the fabrication of multilayer circuits requires that photoresist films of about 1-pm thickness be laid down over a semiconductor surface that has already been patterned in preceding steps. [Pg.175]

Another route to protect polymers from oxygen, light and UV is to encapsulate the part with a continuous film of another, more-resistant polymer to provide a barrier to oxygen. This technology is also used for decoration of plastic parts (in mould decoration or IMD, painting, multilayer sheets for thermoforming. ..). There is no protection against heat. [Pg.206]


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See also in sourсe #XX -- [ Pg.199 ]




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