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Lead thermal oxidation

Properly end-capped acetal resins, substantially free of ionic impurities, are relatively thermally stable. However, the methylene groups in the polymer backbone are sites for peroxidation or hydroperoxidation reactions which ultimately lead to scission and depolymerisation. Thus antioxidants (qv), especially hindered phenols, are included in most commercially available acetal resins for optimal thermal oxidative stabiUty. [Pg.57]

Another example of this rearrangement has been used to prepare 1,2,3-triazole 146 from furazanic phenylhydrazone 147 (Scheme 84) [93JCS(P1)2491]. Interestingly, furoxanic Z-phenylhydrazones 150 underwent thermal recyclization to 1,2,3-triazole A-oxides 152, evidently through intermediate 151. Treatment of the hydrazone 150 with rerr-BuOK leads to the nitromethyl derivative 149 [OOOMIl] (Scheme 84). Lead tetraacetate oxidation of 147 with subsequent Lewis acid treatment of the initially formed intermediate afforded indazole 148 (Scheme 84) (85JHC29). [Pg.107]

The reaction presented above is utilized to leach lead sulfate obtained by thermal oxidation of a mixture of sulfide minerals. The rate of dissolution chemically with a reagent in an... [Pg.474]

The advantage of catalytic thermal oxidation is that the lower temperature of operation can lead to fuel savings (although effective heat recovery without a catalyst can offset this advantage). The major disadvantages of catalytic thermal oxidation are that the catalyst needs to be replaced every two to four years and the capital cost tends to be higher than thermal oxidation without a catalyst. Catalytic thermal oxidation also tends to increase the pressure drop through the system. [Pg.564]

Mechanisms Leading to the Light Emission from Thermally Oxidized Polymers (Chemiluminescence), Similarities and Differences within Respective Groups of Polymers 463... [Pg.451]

MECHANISMS LEADING TO THE LIGHT EMISSION FROM THERMALLY OXIDIZED POLYMERS (CHEMILUMINESCENCE), SIMILARITIES AND DIFFERENCES WITHIN RESPECTIVE GROUPS OF POLYMERS... [Pg.463]

On well characterised non-stabilized PP samples [48] having molar mass within 45-180 kg/mol with differing tacticity and crystallinity, we can see that the increasing molar mass leads to an increase of induction time and reduction of the maximum chemiluminescence intensity (Figure 14). The polymer with higher average molar mass appears to be more stable than that with lower molar mass. This may be ascribed to the effect of increased concentration of more reactive terminal groups, which promote initiation of thermal oxidation. [Pg.480]

Additionally, it should be observed that the thermal oxidability and oxidative polymerization of the unsaturated fatty acids follows the trend linolenic > linoleic > oleic > > palmitoleic (Martinenghi, 1963). The oxidation involves, as first step, the abstraction of a hydrogen atom in allylic position to the double bonds. Certainly, this process is favoured in the case of fatty acids with two or more unconjugated double bonds where the formation of a free radical by allylic hydrogen abstraction leads quite necessarily to double bonds slippage with formation of conjugated double bonds ... [Pg.331]

Polycrystalline oxide materials, both undoped and doped, have been extensively examined for use as photoanodes. Ti02 electrodes have been prepared by thermal oxidation of a Ti plate in an electric furnace in air at 300-800°C (15-60 min) and in a flame at 1300°C (20 min) [27-30]. XRD analysis of thermally oxidized samples indicates the formation of metallic sub-oxide interstitial compounds, i.e. TiOo+x (x < 0.33) or Ti20i y (0 < y < 0.33) and Ti30 together with rutile Ti02 [27]. The characteristic reflection of metallic titanium decreases in intensity after prolonged oxidation (60 min) at 800° C indicating the presence of a fairly thick oxide layer (10-15 pm). Oxidation at 900°C leads to poor adhesion of the oxide film... [Pg.206]

Azides (24) thermally decompose to tetrazines (Equation (8)) <66TL5369> and 4-aminotriazoles (25) are cleaved by lead tetraacetate oxidation (Equation (9)) <70TL385l>, both presumably via the nitrene as intermediate. [Pg.135]

The hydroperoxides obtained on thermal oxidation of cholesteryl acetate (191e) can be selectively separated by SPE and elution with a polar solvent. After reduction to the corresponding alcohols by NaBH4 and further derivatization to the trimethylsilyl ether, the products can be subjected to GLC with ion-trap MS detection. It can be thus demonstrated with the aid of standards that under the oxidation conditions (160 °C for 90 min) only the 7-position is attacked, leading to the la- and 7/3-hydroperoxy derivatives, while the plausible 4-position remains unscathed . Treatment of erythrocite ghosts with t-BuOOH causes a manyfold content increase of 5-hydroxyeicosatetraenoic acid (5-HETE), 5-hydroperoxyeicosatetraenoic acid (5-HPETE) and 5-oxoeicosatetraenoic acid (5-oxo-ETE) residues of phospholipids. These acids can be separated by HPLC, identified and quantitized by tandem MS . ... [Pg.690]

The products of thermal oxidation of polyethylene films can be characterized by C FTNMR furthermore, using the spin-lattice relaxation technique, quantitative estimates can be made of the oxidized functional groups. Observation of the development progress of the various functional groups leads to the postulation of hydroperoxides as the primary oxidation products, which undergo further transformations to the other derivatives in a complex scheme . [Pg.695]

The in situ nature of this treatment also minimizes potential exposure to humans and the environment. Ex situ options like excavation require repeated worker handhng of the contaminated soil and increased opportunity for volatilization of contaminants (leading to off-site contamination). The off-gas stream generated as part of the SPSH process can be treated using conventional off-gas treatment technologies such as catalytic oxidation, thermal oxidation, condensation, and granular activated carbon (GAC). [Pg.489]

The other prevalent method of oxidizing silicon uses wet chemical treatment, often in a sequence of steps called the RCA process [59]. In this process, silicon is both cleaned and oxidized by a process involving treatment with an alkaline mixture of ammonium hydroxide and hydrogen peroxide (called standard clean 1, or SCI), followed by treatment with an acidic HC1 and hydrogen peroxide mixture (SC2). The process leads to what is called a chemical oxide. This, like the thermal oxide, is Si02, but the wet oxidation process typically leads to a more hydroxylated Si02 surface. [Pg.332]


See other pages where Lead thermal oxidation is mentioned: [Pg.568]    [Pg.281]    [Pg.463]    [Pg.414]    [Pg.469]    [Pg.243]    [Pg.1181]    [Pg.272]    [Pg.478]    [Pg.361]    [Pg.9]    [Pg.32]    [Pg.563]    [Pg.330]    [Pg.402]    [Pg.298]    [Pg.490]    [Pg.36]    [Pg.84]    [Pg.151]    [Pg.87]    [Pg.77]    [Pg.86]    [Pg.87]    [Pg.159]    [Pg.9]    [Pg.673]    [Pg.691]    [Pg.624]    [Pg.263]    [Pg.239]    [Pg.673]    [Pg.690]    [Pg.691]    [Pg.345]   
See also in sourсe #XX -- [ Pg.225 ]




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