Invention of Lithography

The invention of hthography dates from 1798 when the playwright Alois 

Senefelder (see Fig. 2.1) writing with ink prepared with wax, soap, and 

Senefelder, Vollstandiges Lehrbuch der Steindruckerey, Karls Thienemann and Gerold, Munich, Vienna, (1818), a complete course in lithography (in German). 

Aqua fortis, or nitric acid, muriatic acid, vinegar, tartaric acid, malic acid, and oxalic acid are typical acids used in stone plate lithography to etch away nonimage, nonwritten areas of the stone, i.e., areas that are not properly covered with grease. 

I now proceeded to apply the printing ink to the stone, for which purpose I first used a common printer s ball but, after some unsuccessful trials, I found that thin piece of board, covered with fine cloth, answered the purpose perfectly, and communicated the ink a more equal manner, than any 

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Figure 2.2 Wooden lithographic press constructed by Alois Senefelder and used in his invention of lithography. (Published with permission from the Deutsches Museum, Munich.)...

Before the invention of the planar transistor, many photoresist processes were developed for the manufacture of circuit boards. Experience gained in this area was rapidly transferred to silicon processing, and much of the early work in integrated circuit lithography can be traced directly to circuit board manufacturing. 

In recent years, an ever increasing number of lithographic techniques have emerged to complement optical lithography, which is still the work horse for practically all pattern replication processes. These developments are driven not only by the need for methods for the replication of sub-100 nm patterns (where conventional lithography is expected to meet its limits), but also by the invention of new high performance, low cost technologies, for example all-polymer based electronics, displays or photovoltaic devices. 

The other landmarks which happened in the middle of the 8O s were a demonstration of the possibility of appheation of the STM apparatus for lithography (Fig. b), and for controlled atom handling. The invention of AFM microscope opened the route for the construction of several different force microscopies (SPM techniques). This way the use of STM/SPM techniques as a Feynman Machine finally had been realized, the STM apprenticeship time came to an end and the time of travel begau... 

Figure 3.1 Key developments in optical physics and chemistry that led to the invention and development of lithography. (Figure continued on next page.)...

Key Developments that Enabled the Invention and Development of Lithography... 

A con rehensive treatment of the history of chemistry has been given elsewhere. In this section, we present only the key points, stretching from the very roots of the field, through the actual beginning of the field as a distinct discipline, and ultimately to the most advanced state of the field in the present era, which are directly related to the invention, development, and evolution of lithography. 

The year 1960 saw the invention of the planar process by Hoerni. This process involves the formation of an oxide layer over a semiconductor surface. And with the aid of lithography, windows are defined on the oxide surface, from which portions of the oxide layer is subsequently removed. Impurity atoms are diffused only through the exposed semiconductor surface, and p-n junctions are formed in the oxide window areas. 

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