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Integrated shadow mask

A number of other polymer deposition techniques may be used in sensor fabrication. Some of the most exciting are techniques adopted from the semiconductor industry. For example, uncross-linked hydrogel precursors can be cast onto the surface of a substrate and UV cross-linked through a shadow mask. This technique allows patterning of the hydrogel to make complex sensor anays on a single sensor substrate, for example, an integrated O2, CO2, and pH sensor array [23]. [Pg.362]

ED photoresists are increasingly being successfully applied to photochemical machining processes in the manufacture of products such as colour TV receiver tube aperture masks (shadow masks), integrated circuit lead frames and printing rollers. These resists are used as etch-resists for a variety of metals and alloys, and can withstand the harsh etching conditions used in these processes. [Pg.78]


See other pages where Integrated shadow mask is mentioned: [Pg.547]    [Pg.55]    [Pg.134]    [Pg.547]    [Pg.55]    [Pg.134]    [Pg.465]    [Pg.557]    [Pg.162]    [Pg.230]    [Pg.465]    [Pg.158]    [Pg.197]    [Pg.413]    [Pg.683]    [Pg.294]    [Pg.458]    [Pg.435]    [Pg.521]    [Pg.598]    [Pg.407]    [Pg.100]    [Pg.55]    [Pg.3]    [Pg.141]    [Pg.2531]    [Pg.2556]   
See also in sourсe #XX -- [ Pg.547 ]




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