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Insulated channel

Fig. 25. OxyTech MGC electroly2er a, membrane b, anode assembly c, manifold spacer d, anolyte outlet e, catholyte outlet f, bulkhead g, brine inlet h, NaOH inlet i, insulating channel j, bulkhead insulator k, interface material 1, cathode assembly m, interceU bus n, tie rod o, current distributor p,... Fig. 25. OxyTech MGC electroly2er a, membrane b, anode assembly c, manifold spacer d, anolyte outlet e, catholyte outlet f, bulkhead g, brine inlet h, NaOH inlet i, insulating channel j, bulkhead insulator k, interface material 1, cathode assembly m, interceU bus n, tie rod o, current distributor p,...
As an illustrative model, consider a rectangular silicon-on-insulator channel waveguide embedded in an oxide cladding, as shown in Figure 7. [Pg.13]

Fig. 1. Current flow (—) and electrical potential distribution (—) between two planar electrodes separated by an insulated channel. Fig. 1. Current flow (—) and electrical potential distribution (—) between two planar electrodes separated by an insulated channel.
In an insulated channel (Figure 1.8c) there is a flow like that in CR, but with the difference that there is a thick frozen layer of plastic on the wall of a channel of very large diameter, and this serves to insulate the fluid core. Its thickness depends on the state of thermal equilibrium between the cold wall of the channel and the hot melt... [Pg.15]

In some cases, for example fast shot sequence and a wide melting temperature range of the injection molding compound, no metallic thermal conduction is needed. If the cross- section of the insulation channel is big enough, 12 to 25 mm diameter, a fluid center allows passage over a certain time (Figure 1.44). The insulation channel solidifies in the case of interruption. An auxiliary parting surface is opened to demold the solidified insulation channel. [Pg.57]

The compressible-flow nature of RESS also affects the solution of Eq. (38). In particular, the wall temperature can be considerably higher than the bulk fluid temperature because as the high-speed fluid is brought to rest, the kinetic energy of the fluid is converted into internal energy. It should be emphasized that this temperature increase occurs even for a perfectly insulated channel wall with no external heating. For the compressible-flow case, Eckert (25) has shown that Eq. (38) can generally be used with the same heat transfer relations used for incompressible flow if the bulk fluid temperature is replaced with the adiabatic wall temperature Tad,w, so that... [Pg.409]

The carbon black in semiconductive shields is composed of complex aggregates (clusters) that are grape-like stmctures of very small primary particles in the 10 to 70 nanometer size range (see Carbon, carbon black). The optimum concentration of carbon black is a compromise between conductivity and processibiUty and can vary from about 30 to 60 parts per hundred of polymer (phr) depending on the black. If the black concentration is higher than 60 phr for most blacks, the compound is no longer easily extmded into a thin continuous layer on the cable and its physical properties are sacrificed. Ionic contaminants in carbon black may produce tree channels in the insulation close to the conductor shield. [Pg.329]

Insulator Walls. Because of the unavailabiUty of electrically insulating materials which can withstand the harsh environment inside coal-fired channels, the insulator walls of the channel are typically made of metal elements which are insulated from each other to prevent any net flow of current. Like electrode walls, insulator walls are designed to operate with a slag coating. [Pg.430]

Figure 14-7. A MISFET in operation, (a) VK>V l/j=0 an n-lypc channel of constant thickness forms at the insulator-semiconductor interlace, (b) V, > V , Vlt - Vy, the channel is pinched ofl at the drain contact. The white area that separates the p-lype substrate from the ii-lypc contacts and channel represents the depletion layer. Figure 14-7. A MISFET in operation, (a) VK>V l/j=0 an n-lypc channel of constant thickness forms at the insulator-semiconductor interlace, (b) V, > V , Vlt - Vy, the channel is pinched ofl at the drain contact. The white area that separates the p-lype substrate from the ii-lypc contacts and channel represents the depletion layer.

See other pages where Insulated channel is mentioned: [Pg.601]    [Pg.603]    [Pg.476]    [Pg.751]    [Pg.548]    [Pg.16]    [Pg.103]    [Pg.194]    [Pg.194]    [Pg.195]    [Pg.73]    [Pg.73]    [Pg.601]    [Pg.603]    [Pg.476]    [Pg.751]    [Pg.548]    [Pg.16]    [Pg.103]    [Pg.194]    [Pg.194]    [Pg.195]    [Pg.73]    [Pg.73]    [Pg.428]    [Pg.428]    [Pg.428]    [Pg.431]    [Pg.431]    [Pg.432]    [Pg.76]    [Pg.142]    [Pg.355]    [Pg.371]    [Pg.371]    [Pg.372]    [Pg.107]    [Pg.509]    [Pg.1048]    [Pg.503]    [Pg.10]    [Pg.1053]    [Pg.241]    [Pg.244]    [Pg.249]    [Pg.249]    [Pg.249]    [Pg.260]   
See also in sourсe #XX -- [ Pg.349 ]




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