INDEX plasma nitriding

Silicon nitride films deposited in para 11 el-pi ate, plasma-enhanced CVD reactors will be discussed in greater detail in a later chapter. However, they typically have a refractive index on the order of 2.0, partly because of hydrogen incorporated into the layer, and the ECR films appear similar. Also, as... 

Ellipsometric measurements of the PEO 900 kDa physically adsorbed layer on the plasma cleaned silicon nitride coated wafer indicate that the PEO layer thickness in air is 1.94 + 0.10 nm using a measured refractive index of 1.94 for silicon nitride and an assumed refractive index of 1.45 for PEO in air. 

---