In-situ AFM imaging

Fig. 5.10. Series of sequential in-situ AFM images of the growth of ODS on silicon. The numbers indicate the adsorption time in minutes.

Figure 7. In-situ AFM imaging of synthetic graphite flakes (a, b), MCMB particles (c, d) and natural graphite particles (e,f during the first cathodic polarization of the electrodes in the probe solution (LiClO/EC-PC), measured at the indicated potentials vs. Li/Li. The arrows and circles point to the relevant morphological processes, as detailed in the text (see ref 26).

Topographic AFM examination of organic dyes under the appiication of reductive and oxidative potentials appears to be consistent with the above modeling [168], This can be seen in Fig. 2.25 where in situ AFM images from the upper face and sides of crystals of indigo (a) before, and (b) after application of a linear potential step between 0.0 and +0.75 V at a potential scan rate of lOmV/s are shown. Here,... 

Figure 16 In situ AFM images of single P-sheet tapes grown on mica from 5 (XM Pu-2 in 10% H20 in 2-propanol. The tapes are aligned with the hexagonal symmetry of the underlying mica lattice (Whitehouse et al., 2005).

Fig. 35. Sequence of high-resolution in-situ AFM images of p-InSe showing the formation of an insoluble Se layer as the bias becomes anodic. The potential is scanned positively between images (a) and (d). The potential is scanned negatively afterwards and atoms are visible again in (f) (after [22]).

Fig. 36. High-resolution in-situ AFM image of Ge( 11) in H2SO4 (a) and time sequence of images (b) showing the growth of a hydride layer. The regular rectangular shape of features, which should be dendrites, is due to tip imaging (after [21]).

Figure 6.35 In situ AFM images of a YBa2Cu307 thin film surface c-axis oriented (a) and a-b-axis oriented (b) at hE = 50 mV in the system YBa2Cu307. CH3CN + 0.1 M C16H36CINO4 + 3.3 x 10 M [CH3COCH=C(a)CH3l2Cu at T= 298 K [6.190].

Fig. 2 In situ AFM images (left) and line scans (right) of biotinylated vesicles with a nominal diameter of 100 nm attached to a streptavidin monolayer, a A low biotin content (2 mol %) results in the adsorption of intact liposomes within the timescale of observation (about Ih) b a high biotin content (30mol%) yields planar lipid bUayers exhibiting a typical height of 5-6 nm...

Fig. 9. In-situ AFM image of a YBa2Cu307.s thin-film surfece (c-axis oriented) under electrochemical conditions in the system YBa2Cu3O7V3.3xl0 M [CH3COCH=COCH3]2 Cu + CH3CN + 0.1 M C,6H36C1N04 at 7 = 298 K, contact mode.

In 2009 Y. Wang, B. Bhushan, and X. Zhao [9] came with the interesting finding that nanobubbles may cause rearrangement of polymeric hydrophobic surfaces, which they adhere to. They correlated in situ AFM images of nanobubbles appearing on supported thin polystyrene film immersed in water with nanoindents gradually formed at nanobubble positions (Fig. 12.3). 

Figure 5 displays a series of in situ AFM images that were recorded over a 24-h period at the corrosion potential, around the selected inclusion. Figure 5(a) shows the surface prior to exposure to solution. The location of the AlsFe inclusion is clearly evident. One hour after addition of solution (Fig. 5b), the begirmings of the formation of a trench, around the inclusion site, is observed. Over a further period of time, as the metal adjacent to the inclusion site dissolves further, the trench widens, resulting in the formation of a circular pit (Fig. 5c, d). This behavior was attributed to oxygen reduction taking... 

Figure 12.53 In situ AFM image of a carb on fiber after electrochemical treatment in NH4HCO3 for tOmin.

Fig. 9 Real-time in situ AFM images acquired during growth of a type i -(ET)2i3 overlayer on a pitted HOPG electrode substrate. Lateral force images are shown here to depict better the contrast between the monolayer and the HOPG substrate. The overlayer initially covers the open terraces, with pits filling in overtime, from larger to smaller pits, statistically.

Figure 17 The release of bovine serum albumin from a poly (ortho-ester) film, The in situ AFM images show the dissolution of protein from the eroding pohmer film after (A) 0 min. (B) 45 min. (C) 90 min. exposure to a pH 6.0 solution (Shakesheff et al., 1994).

Nanoindentation and nanoscratch measurements were taken to determine hardness and modulus distributions with respect to depth as well as the shear strength and friction coefficient of the tribofilms on a nanometer scale [1, 32]. Both measurements were combined with in situ AFM observations to find a flat film area less influenced by roughness and to confirm the indent or scratch made on the tribofilms from topographic images after the test. In these observations, the same diamond tip was used as the stylus for indentation or scratching as well as the AFM probe for obtaining in situ AFM images. 

A Berkovich diamond tip with a total included angle of 142.3° and a radius of around 150 nm was used for the nanoindentation measurements [1-2]. Indentation load-displacement curves were obtained by applying loads ranging from 1 pN to 1 mN. The hardness and reduced elastic modulus of the tribofilms were determined with Oliver s method [35,36], where fused silica with a Young s modulus of 69.7 GPa was used as a standard sample for tip-shape calibration to determine the function of the contact area with respect to the contact depth in a range of 1.5-50 nm. Figure 9.5 shows indentation load-displacement curves obtained for the MoDTC/ZDDP and ZDDP tribofilms at a maximum load of 600 pN and in situ AFM images of the residual indent. A plastic pileup was clearly observed around the indent on both the MoDTC/ZDDP and ZDDP tribofilms. 

FIGURE 9.5 Indentation load-displacement curves of the MoDTC/ZDDP and ZDDP tribo-fibns at a maximum load of 600 pN and in situ AFM images of the residual indent. No significant differences in hardness and modulus between the MoDTC/ZDDP and ZDDP tribofilms were observed under this loading condition. 

FIGURE 9.6 Nanoscratch data of the MoDTC/ZDDP tribofilm at a constant normal force of 1000 iN. (a) Normal force vs. time and scratch displacement vs. time, (b) lateral force vs. time and normal displacement vs. time, and (c) friction coefficient vs. time and in situ AFM image of the residual scratch groove. 

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