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Hot filament chemical vapor deposition HFCVD

Hot-filament chemical vapor deposition (HFCVD), 17 214-215 Hot-fill market, 20 50-52 Hot-film anemometers, 11 676 Hot flocking, 7 59... [Pg.443]

The OAG method has a general nature and can be applied to a variety of materials other than Si. Based on the OAG method, we have synthesized nanowires of a wide range of semiconducting materials including Ge [35], GaN [36, 37], GaAs [38, 39], GaP [41], SiG [40], and ZnO (whiskers) [42]. The actual OAG process was activated by laser ablation, hot-filament chemical vapor deposition (HFCVD) or thermal evaporation. [Pg.335]

The cell employed for the electrolytic production of NF3 was a cylindrical nickel cell of 1.5 dm in volume. A BDD with boron concentrations of 2500, 5000, 7500, 8000,10 000, and 12 500 ppm was used as the anode for the electrolytic production of NF3. For galvanostatic measurement of the anode polarization curve, a carbon anode (FE-5 Toyo Tanso Co., Ltd.) was also used in addition to the BDD anode. The BDD thin film (Permelec Electrode Ltd.) was prepared by the hot filament chemical vapor deposition (HFCVD) method on a carbon substrate using a gas mixture composed of CH4-H2-B(CH30)3-Ar. The anode was located at the center of the cell and the cell wall was utilized as the cathode. A nickel rod of 0.1 cm surface area pre-treated with anodic oxidation in a dehydrated NH4F-2HF melt was used as the reference electrode. The nickel rod functions as NiF Oy/Ni (0.073 V versus RHE) [4]. A PTFE skirt was provided between the anode and the cathode compartments, and the anode gas was separated from hydrogen evolved at the cathode to prevent an explosion. The cell bottom was covered with a PTFE sheet to avoid hydrogen evolution. [Pg.124]

These specialized forms of CVD, referred to as nontraditional techniques for the purpose of this review, include laser (LCVD), aerosol (ACVD), hot filament (HFCVD), and ion beam (IBGVD) chemical vapor deposition. In such enhanced CVD technologies, a thermal CVD reaction occurs simultaneously with another driving force, which results... [Pg.164]


See other pages where Hot filament chemical vapor deposition HFCVD is mentioned: [Pg.65]    [Pg.432]    [Pg.65]    [Pg.432]    [Pg.120]    [Pg.762]    [Pg.231]    [Pg.387]   
See also in sourсe #XX -- [ Pg.898 ]




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