High vapor pressure organometallics

Uses Inexpensive Precursors Soluble precursors are used instead of expensive, high vapor pressure organometallics. 

Many analytes may form volatile species with other elements in the sample, for example, halides, or be present in compounds that exhibit high-vapor pressures at relatively low temperatures (mercury, arsenic, selenium, organometallics). Such compounds may be volatilized and swept from the tube, in molecular form, prior to the atomization step. These losses can be dealt with by adding a large excess of a reagent (a modifier) to change, in situ, the thermochemical behavior of the analyte and the matrix. 

When the products are partially or totally miscible in the ionic liquid, the separation of the products can be more complicated. It is however possible to reduce the solubility of typical organic products in the ionic liquid by introducing a more polar solvent that can be separated by distillation afterward at a lower temperature (27). Because of the low vapor pressure of the ionic liquid, direct distillation can be applied without azeotrope formation (28). However, such operation is often limited to highly volatile or thermally labile products because of the general thermal instability of organometallic catalysts. 

The choice of the precursor will depend on the reaction medium. High vacuum deposition methods use volatile organometallic precursors or ion, atom or molecule beams. Normal pressure vapor methods use similar volatile precursors, or sprayed metal salt solutions. Aqueous solution methods use water soluble salts, and organic solution methods use organometallic soluble compounds. Typical chemical reactions to generate the growth units are ... 

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