High glow discharge mass spectrometry

The conventional method for quantitative analysis of galHum in aqueous media is atomic absorption spectroscopy (qv). High purity metallic galHum is characteri2ed by trace impurity analysis using spark source (15) or glow discharge mass spectrometry (qv) (16). 

The experiments were carried out on high purity aluminium from different producers (Table I) and Al-Ga alloys. The impurity concentration in the used materials was determined by glow discharge mass-spectrometry. The total impurity content in pure aluminium (0.4 - 7.7 ppm) was defined as the sum of the concentration of all found elements.The residual resistivity ratio RRR=p(273K)/p(4.2K) of the materials was measuredby the method prescribed by the U.S. National Bureau of Standards. 

Table 9.4 Result of trace analysis of high purity indium and zinc measured by spark source mass spectrometry (SSMS) and glow discharge mass spectrometry (GDMS), respectively.

Fourier transform infrared spectroscopy glow discharge mass spectrometry glow discharge optical spectrometry high energy electron diffraction high vacuum... 

Deng R. C. and Williams P. (1994) Suppression of cluster ion interferences in glow discharge mass spectrometry by sampling high-energy ions from a reversed hollow cathode ion source, Anal Chem 66 1890-1896. 

Mykytiuk A. P., Semeniuk P. and Berman S. (1990) Analysis of high purity metal and semiconductor materials by glow discharge mass spectrometry, Spectrochim Acta Rev 13 1-10. 

Saito M., Hirose F. and Okochi H. (1995) Comparative study of the determination of micro-amounts of boron in high-purity molybdenum by a spectrophotometric method using curcumin, spark source mass spectrometry and glow discharge mass spectrometry, Anal Sci 11 695-697. 

Van Straeten M. and Gijbels R. (1995) Determination of the scandium content of high-purity titanium using inductively coupled plasma mass spectrometry and glow discharge mass spectrometry as part of its certification as a reference material, J Anal At Spectrom 10 849-852. 

Jager, R., Saprykin, A.I., Becker, J.S., Dietze, H., Broekaert, J.A.C. (1997) Analysis of semicondncting materials by high-resolntion radiofreqnency glow discharge mass spectrometry. Microchimica Acta, 125, 41-A4. 

Valiga, R E., Duckworth, D C., Smith, D.H. (1996) Effects of high purity support gas in quadrupole-based glow discharge mass spectrometry. Rapid Communications in Mass Spectrometry, 10,305-310. 

Guidoboni, R.J., Leipziger, ED (1988) Glow discharge mass spectrometry— The newest tool for high purity materials analysis. Journal of Crystal Growth, 89,16-20. 

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