High-fe Gate Oxides

FIGURE 20.12 Example of Finfet fabrication using two CMP steps (from Ref. 10). 

To see how high-fe oxides impact the transistor performance, one can look at the equation for the drain current of an MOS transistor [11]  

Pft strip and FUSI the poly of n-FET (e.g., Yb-dopad Ivli FUSI) 

FIGURE 20.13 Metal gate transistors fabricated using CMP to enable exposure of the top of NMOS and PMOS gates (independently) followed by FUSI reaction of gates to form silicided metal gates (from Ref 12). 

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