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Gas-phase lubrication, of MEMS devices

Gas-Phase Lubrication of MEMS Devices Using Alcohol Vapor Adsorption Isotherm for Lubrication of Silicon Oxides... [Pg.1143]

The surface of all inorganic materials exposed to ambient (humid) air is always covered with a thin layer of water adsorbed from the gas phase. The thickness of the adsorbed water layer varies with the humidity and surface chemistry. This water layer has been shown to reduce wear in MEMS operation. However, the high surface tension of the water film can cause an in-use stiction problem. The gas-phase lubrication concept discussed here employs the same equilibrium adsorption principle as the water adsorption in humid environments. The difference is that our approach utilizes a surfactant-like molecule that can provide low adhesion and good lubrication. The entry summarizes the advantages of gas-phase lubrication for MEMS devices and discusses the effect of alcohol adsorption on the adhesion and lubrication of silicon oxide surfaces. [Pg.1143]


See other pages where Gas-phase lubrication, of MEMS devices is mentioned: [Pg.1144]    [Pg.1143]   
See also in sourсe #XX -- [ Pg.1143 , Pg.1144 , Pg.1145 , Pg.1146 , Pg.1147 , Pg.1148 , Pg.1149 ]




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