Future Challenges and Outlook

Another fundamental weakness of block copolymer lithography is the inability to fabricate not only various geometries, but also geometries of multiple sizes and pitches within one resist layer. One possible solution may lie in block copolymers that can be crosslinked through the use of blended photoactive compounds, such as work shown by the Ober group on PaMS-h-PHOST (Bosworth et al., 2008). While it has already been shown that solvent 

and Simon, P.F.W. (2005) Phase behavior and morphologies of block copolymers. Advances in Polymer Science, 189,125-212. 

Aizawa, M. and Buriak, J.M. (2006) Nanoscale patterning of two metals on silicon surfaces using an ABC triblock copolymer template. Journal of the American Chemical Society, 128(17), 5877-5886. 

Angelescu, D.E., Waller, J.H. etal. (2004) Macroscopic orientation of block copolymer cylinders in single-layer films by shemng. Advanced Materials, 16(19), 1736-1740. 

---