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Block copolymer lithography

Block Copolymer Lithography Employing Nanoporous Templates. 145... [Pg.149]

Choi, D-G., et al. (2004), 2D nano/micro hybrid patterning using soft/block copolymer lithography, Mater. Sci. Eng., 24(1-2), 213-216. [Pg.1316]

Fig. 15 Schematic illustration of ultralarge-area block copolymer lithography procedure. Fig. 15 Schematic illustration of ultralarge-area block copolymer lithography procedure.
Jeong S-J, Moon H-S et al (2010) Ultralarge-area block copolymer lithography enabled by disposable photoresist prepatteming. ACS Nano 4 5181-5186... [Pg.192]

Figure 10.6 Procedure for polymer nanowire fabrication. An aqueous PEDOTtPSS solution was spin-coated on a substrate patterned with a 1.3 ym period grating, then coated with a thin Si02 layer and a PDMS homopolymer brush. A PS-PDMS block-copolymer thin film was then spin-coated and solvent-annealed. The self-assembled block-copolymer patterns were transferred into the underlying PEDOT-.PSS film through a series of reactive ion etching steps employing CF4 and O2 plasmas. (Reprinted with permission from Nano Letters, Nanowire Conductive Polymer Gas Sensor Patterned Using Self-Assembled Block Copolymer Lithography by Y. S. Jung et al., 8, 11. Copyright (2008) American Chemical Society)... Figure 10.6 Procedure for polymer nanowire fabrication. An aqueous PEDOTtPSS solution was spin-coated on a substrate patterned with a 1.3 ym period grating, then coated with a thin Si02 layer and a PDMS homopolymer brush. A PS-PDMS block-copolymer thin film was then spin-coated and solvent-annealed. The self-assembled block-copolymer patterns were transferred into the underlying PEDOT-.PSS film through a series of reactive ion etching steps employing CF4 and O2 plasmas. (Reprinted with permission from Nano Letters, Nanowire Conductive Polymer Gas Sensor Patterned Using Self-Assembled Block Copolymer Lithography by Y. S. Jung et al., 8, 11. Copyright (2008) American Chemical Society)...
Y.S. Jung, W. Jung, H.L. Tuller, and C.A. Ross, Nanowire conductive polymer gas sensor patterned using self-assembled block copolymer lithography. Nano Lett., 8, 3776-3780 (2008). [Pg.598]

Kim, D., Jeon, S.-B., Kim, J.Y., Seol, M.-L., Kim, S.O., Choi, Y.-K., 2015a. High-performance nanopattern triboelectric generator by block copolymer lithography. Nano Energy 12,331-338. [Pg.191]

M. Park, G. Harrison, P. M. Chaikin, R. A. Register, D. H. Adamson, Block copolymer lithography Periodic arrays of -1011 Holes in 1 square centimeter. Science 1997,276,1401. [Pg.323]

J. Y. Cheng, C. A. Ross, E. L. Thomas, H. I. Smith, G. J. Vancso, Fabrication of nanostructures with long-range order using block copolymer lithography. Appl. Phys.Leii. 2002,81,3657. [Pg.324]

FIGURE 5.7 Principle of block copolymer lithography for spatially defined placing of gold nanoparticles on surfaces [16]. (a) Block copolymer stmcture, (b) formation of micelles with a metal ion core, and (c) formation of thin hlms hy dip coating and plasma treatment to remove organic layer. (See insert for color representation of the figure.)... [Pg.194]

FIGURE 5.8 Scheme for the control of cell s integrin clustering at nanostructured and biofunctionalized substrates (based on spatially defined deposition of gold nanodots through block copolymer lithography). Source Adapted from Arnold et al. [17], figure 2. Reproduced with permission from John Wiley Sons. [Pg.328]

Ross, C.A., Cheng, J.Y. Patterned magnetic media made by self-assembled block-copolymer lithography. MRS Bull. 33, 838 (2008)... [Pg.92]

Park, M., Harrison, C., Chaikin, P.M., Register, R.A., Adamson, D.H. Block copolymer lithography periodic arrays of similar to lO" holes in 1 square centimeter. Science 276,1401... [Pg.92]

Block copolymer lithography merging bottom-up with top-down processes. MRS Bull, 30, 952-966. [Pg.190]

S. O. (2008) Universal block copolymer lithography for metals, semiconductors, ceramics, and polymers. Adv. Mater, 20, 1898-1904. [Pg.190]

T. P., Drockenmuller, E., and Hawker, C. J. (2006) Fabrication of densely packed, well-ordered, high-aspect-ratio silicon nanopillars over large areas using block copolymer lithography Thin Solid Films, 513, 289-294. [Pg.190]

Reprinted from C. Tang, E.M. Lennon, G.H. Fredrickson, E.J. Kramer, C.J. Hawker, Evolution of block copolymer lithography to highly ordered square arrays. Science 322 (2008) 429-432. [Pg.146]

Cheng JY, Ross CA, Chan VZ-H, Thomas EL, Lammertink RGH, Vancso GJ (2001) Formation of a cobalt magnetic dot array via block copolymer lithography. Adv Mater 13 1174-1178... [Pg.179]

Andreozzi A, Lamagna L, Seguini G, Fanciulli M, Schamm-Chardon S, Castro C, Perego M (2011) The fabrication of tunable nanoporous oxide surfaces by block copolymer lithography and atomic layer deposition. Nanotechnology 22 335303... [Pg.97]


See other pages where Block copolymer lithography is mentioned: [Pg.157]    [Pg.158]    [Pg.145]    [Pg.146]    [Pg.412]    [Pg.417]    [Pg.92]    [Pg.108]    [Pg.114]    [Pg.193]    [Pg.195]    [Pg.305]    [Pg.601]    [Pg.145]    [Pg.146]    [Pg.518]    [Pg.519]    [Pg.764]   
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See also in sourсe #XX -- [ Pg.195 ]

See also in sourсe #XX -- [ Pg.764 , Pg.768 , Pg.770 , Pg.775 , Pg.784 ]




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Lithography with block copolymer

Lithography with block copolymer microdomains

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