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Free-flow layouts

The process flow layout for the twin-screw mixer set up is presented in Figures 3.12 and 3.16. As noted above, the metering screws for feeding powder, rubber, and pellets would each have a different design, each optimized for trouble-free smooth delivery of the blend components. The rate is affected by the ability of the feed port to handle the bulky compounds. In reality, this is often the limiting factor in production of blend compounds that have fluffy fillers. [Pg.128]

Figure 7,3 Coupling chip-based free-flow electrophoresis nanoESI-MS. (a) Layout of a microfluidic free-flow electrophoresis-MS chip (I = left), (b) The analysis principle. The separated analytes are directed towards the mass spectrometric outlet by alteration of the buffer s hydrodynamic flow. Arrows indicate relative flow rates and the rectangle ( ) labels the area visualized by fluorescence imaging [46]. Reproduced from Benz, C., Boomhoff, M., Appun, j., Schneider, C., Beider, D. (2015) Chip-based Tree-Flow Electrophoresis with Integrated Nanospray Mass-Spectrometry. Angew. Chem. Int. Ed. 54 2766-2770 with permission from lohn Wiley and Sons... Figure 7,3 Coupling chip-based free-flow electrophoresis nanoESI-MS. (a) Layout of a microfluidic free-flow electrophoresis-MS chip (I = left), (b) The analysis principle. The separated analytes are directed towards the mass spectrometric outlet by alteration of the buffer s hydrodynamic flow. Arrows indicate relative flow rates and the rectangle ( ) labels the area visualized by fluorescence imaging [46]. Reproduced from Benz, C., Boomhoff, M., Appun, j., Schneider, C., Beider, D. (2015) Chip-based Tree-Flow Electrophoresis with Integrated Nanospray Mass-Spectrometry. Angew. Chem. Int. Ed. 54 2766-2770 with permission from lohn Wiley and Sons...
The electron source of the PIMMS is an argon plasma. Inside the plasma chamber the gas is ionized by a 2.45 GHz microwave field, ignited by an electric spark. In the plasma chamber free electrons are created, that are accelerated by a static electric field for impact ionization of the sample gas atoms. The layout of the plasma chamber has to incorporate both the fluidic and the electrostatic requirements. On the one hand the gas apertures of the chamber must have the appropriate dimensions to assure that the gas flow out of the chamber is low. On the other hand the geometry must be such that most of the electrons are generated close to the outlet of the chamber and can be extracted through this small aperture. Electrons should be generated close to the acceleration field, which intrudes the chamber only to a small depth. [Pg.430]

The MAC method, which allows arbitrary free surface flows to be simulated, is widely used and can be readily extended to three dimensions. Its drawback lies in the fact that it is computationally demanding to trace a large number of particles, especially in 3D simulation. In addition, it may result in some regions void of particles because the density of particles is finite. The impact of the MAC method is much beyond its interface capmring scheme. The staggered mesh layout and other features of MAC have become a standard model for many other Eulerian codes (even numerical techniques involving mono-phase flows). [Pg.347]

Small-diameter caps can give more slot area and more free space for liquid flow than large caps. Caps larger than 6 in. in diameter are seldom employed and, except in small laboratory columns, caps less than 3 in. are not used because of the mechanical problem of handling the large number of them needed even for plates of moderate diameter. With the usual cap design and plate layout, the ratio of total slot area to superficial area generally falls between 0.1 to 0.2. [Pg.431]


See other pages where Free-flow layouts is mentioned: [Pg.406]    [Pg.406]    [Pg.406]    [Pg.406]    [Pg.272]    [Pg.87]    [Pg.1171]    [Pg.498]    [Pg.22]    [Pg.508]    [Pg.263]    [Pg.307]    [Pg.93]    [Pg.399]    [Pg.856]    [Pg.148]    [Pg.468]    [Pg.328]    [Pg.318]    [Pg.319]    [Pg.261]    [Pg.193]   
See also in sourсe #XX -- [ Pg.406 ]




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