Fluoropolymers outgassing

On the other hand, fluoropolymer outgassing on exposure to FIB is characterized by main chain scission followed by evolution of flurocarbons with large mass number ( 298 amu or more) and with low boiling point. 

Besides the use in F2 and F2 immersion lithography, fluoropolymers are used in various fields. Fluoropolymer is one of the candidate for a polymer for MEMS, and fabrication of fluoropolymers by ultra-short pulsed lasers (9), and synchrotron radiations (10) has been studied. Polymer outgassing as well as the micro- and nano-fabrication depends on the polymer radiolysis. It is important for the micro- and nano-fabrication to investigate outgassing characteristics which is obvious outcome in the polymer radiolysis. 

In the present study, we investigated outgassing characteristics of fluoropolymers for semiconductor industry on exposure to 157 nm, and also investigated outgassing characteristics of PTFE on exposure to focused ion beam (FIB). Outgassed species from these fluoropolymer were detedted by in-situ quadrupole mass spectrometry. 

Figure la shows the experimental set-up for measurement of outgassed species from fluoropolymers on exposure to 157 nm. The exposure source is a LAMBDA PHYSIK OPTex UV excimer laser (Wavelength 157 nm, Power 0.8 mJ/pulse, Rep. Rate 30 Hz, Pulse duration 5-10 ns FWHM, laser intensity 2 MW/cm2) where a vacuum chamber was connected via CaF2 lens. A PFEIRRER... 

Outgassed Species from Fluoropolymers for F2 lithography on Exposure to 157 nm... 

On exposure to 157 nm, scission of side chain and C-F bond plays an important roll in outgassing characteristics. Some fluoropolymers for semiconductor industry produce harmful outgassed species of HF which... 

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