Fluoropolymers outgassed species

In the present study, we investigated outgassing characteristics of fluoropolymers for semiconductor industry on exposure to 157 nm, and also investigated outgassing characteristics of PTFE on exposure to focused ion beam (FIB). Outgassed species from these fluoropolymer were detedted by in-situ quadrupole mass spectrometry. 

Figure la shows the experimental set-up for measurement of outgassed species from fluoropolymers on exposure to 157 nm. The exposure source is a LAMBDA PHYSIK OPTex UV excimer laser (Wavelength 157 nm, Power 0.8 mJ/pulse, Rep. Rate 30 Hz, Pulse duration 5-10 ns FWHM, laser intensity 2 MW/cm2) where a vacuum chamber was connected via CaF2 lens. A PFEIRRER... 

Outgassed Species from Fluoropolymers for F2 lithography on Exposure to 157 nm... 

On exposure to 157 nm, scission of side chain and C-F bond plays an important roll in outgassing characteristics. Some fluoropolymers for semiconductor industry produce harmful outgassed species of HF which... 

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