Energetic film deposition methods

Spalvins, T., Energetics in Vacuum Deposition Methods for Depositing Solid Film Lubricants, Lubric. Eng., 25, 436, (1969). 

In ion assisted deposition, there are two methods one is decomposition of hydrocarbon oil using energetic ions and the other is evaporation of graphite with eoncurrent bombardment of the growing film with energetic ions. With these methods, diamond like films with reasonably good properties can be deposited over large areas (1 m ) at low temperatures (< 140°C). 

APD, or cathodic arc deposition, has been traditionally applied for preparing dense thin films of corrosion-resistant, protective, and decorative coatings, such as TiN, TiC, and CrN [25-27], This method is usually regarded as physical vapor deposition (PVD), but it differs from other PVD methods in that energetic plasma ions condense to form dense films in APD, while in other PVD methods, it is the vapor of neutral atoms that condense [25],... 

In soluble systems, such as Ti-Cu metallization, this method of forming the interface avoids the potential problem of oxidation of the titanium before the copper is deposited. If oxidation occurs before the copper layer is deposited, the adhesion between the titanium and the copper layers will be poor. The pseudodiffusion type of interface may also be formed by recoil implantation during concurrent or subsequent ion bombardment.The use of energetic ions of the film material (film ions) allows ion implantation to form the pseudodiffusion interface. 

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