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Electron mask based

The two principal modes of operation of electron-beam exposure systems include the maskless direct-write electron-beam machines and the mask-based electron-beam machines. Direct-write electron-beam machines operate directly from design data and are capable of extremely high resolution. Mask-based electron-beam systems utilize masks in their imaging process. The implementation of electron-beam lithography in mix-and-match mode with optical lithography in a manufacturing environment has been demonstrated. [Pg.168]

A. Acharya, S. Meher, An efficient, adaptive unshaip masking based interpolation for video intra frame upsampling, in Proceedings of IEEE Asia Pacific Corference on Postgraduate Research in Microelectronics and Electronics, Prime Asia, Dec. 2012, pp. 100-105... [Pg.74]

Pt—Q—Salt, [Pt(NH3)2(HP04)] and [Pt(OH)3] (259,260). Chloride-based baths have been superseded by P-Salt-based baths, which are more stable and relatively easily prepared. Q-Salt baths offer even greater stabiUty and produce hard, bright films of low porosity. Plating under alkaline conditions employs salts of [Pt(OH3)] . These baths are easily regenerated but have low stabiUty. Platinum films have uses in the electronics industry for circuit repair, mask repair, platinum siUcide production, and interconnection fabrication (94). Vapor deposition of volatile platinum compounds such as [Pt(hfacac)2] and... [Pg.184]

The oxazoline ring acts as an electron-withdrawing group for a substituent at the 2-position. Thus, the ot-protons of a 2-alkyloxazoline exhibit some acidity and can be abstracted by a base. A 2-alkenyloxazoline can be viewed as a masked acrylic acid derivative and is capable of undergoing Michael addition and Diels-Alder reactions. These reactions can often be carried out stereoselectively using a chiral oxazoline. Other types of chiral auxilliaries, most notably oxazolidinones, are also very effective for these types of applications. However, they are outside the scope of this chapter. The discussion in this section will focus on the new developments with oxazolines. [Pg.442]

This treatment is based on the inadequate three-parameter theory of the free ion on the one hand and does not account for covalency effects on the other. Indeed, three main absorption bands are found, the third of which is of low intensity (two electron jump) and located in the UV-region. It is only observed in cases where it is not masked by charge-transfer transitions. In addition, some peaks of very weak intensity are found in the visible region around the first two main bands (Fig. 1, 2 Table 2). While A is fixed by the energetic position of the first main band, B may be calculated from the second (or third) main band by the formula ... [Pg.31]


See other pages where Electron mask based is mentioned: [Pg.211]    [Pg.284]    [Pg.462]    [Pg.120]    [Pg.354]    [Pg.403]    [Pg.155]    [Pg.134]    [Pg.203]    [Pg.385]    [Pg.134]    [Pg.391]    [Pg.513]    [Pg.226]    [Pg.41]    [Pg.372]    [Pg.240]    [Pg.144]    [Pg.194]    [Pg.108]    [Pg.359]    [Pg.91]    [Pg.47]    [Pg.109]    [Pg.214]    [Pg.335]    [Pg.270]    [Pg.110]    [Pg.81]    [Pg.145]    [Pg.234]    [Pg.133]    [Pg.241]    [Pg.391]    [Pg.121]    [Pg.302]    [Pg.7]    [Pg.513]    [Pg.194]    [Pg.61]    [Pg.21]    [Pg.385]    [Pg.1046]   
See also in sourсe #XX -- [ Pg.168 ]




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