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Electron halide vapors, produced

Relative Ion Intensities of Alkali Halide Vapors, Produced by Electron Impact ... [Pg.277]

The main commercial use of solid SiO is as a vapor-deposition material for the production of SiOx thin films for optical or electronic applications (antireflective coatings, interference filters, beam-splitters, decorative coatings, dielectric layers, isolation layers, electrodes, thin-film capacitors, thin-film transistors, etc.), for diffusion barrier layers on polymer foils or for surface protection layers.Other uses for SiO have been proposed, such as the substitution of elemental silicon in the Muller-Rochow process for the production of organosilicon halides, because solid SiO can be produced at lower temperatures than elemental silicon. [Pg.242]


See other pages where Electron halide vapors, produced is mentioned: [Pg.271]    [Pg.157]    [Pg.64]    [Pg.168]    [Pg.249]    [Pg.201]    [Pg.202]    [Pg.183]    [Pg.463]    [Pg.11]    [Pg.62]   
See also in sourсe #XX -- [ Pg.277 ]




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