Electrodeposition vs Surface Hydrophobicity

the scaling function f is such that w l, t) = (normal scaling) or 

In general, the higher values of scaling exponents for particular electrodeposition process mean that the roughness of electrodeposited films develops faster over the space and time ordinates. 

The similar experimental approach has been recendy described by Schirtcliffe et where the electrodeposition of Cu at extremely high current densities was 

The author would like to acknowledge the support of the University of Houston and 

Texas Center for Superconductivity during preparation of this article. 

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